Home › Research › EUV Lithography at the SEMATECH-Berkeley Microfield Exposure Tool Facility (BMET) › The World's Highest Resolution Projection EUV Lithography Tool

The World's Highest Resolution Projection EUV Lithography Tool

Printer-friendly versionPrinter-friendly versionPDF versionPDF version

The SEMATECH-Berkeley MET achieves its world leading performance through the precise manipulation of illumination coherence. Through the use of the unique scanner module and undulator radiation from the ALS, lossless variable illumination can be achieved in patterns such as those pictured here.

Synthesized Pupil Fill Functions

coherence (a) coherence (b) coherence (c) coherence (d) coherence (e)
45-dipole, S=0.1, O=0.57 45-dipole, S=0.25, O=0.64 Y-dipole, S=0.1, O=0.5 X-dipole, S=0.2, O=1

resolution vs coherence function

This coherence control has been demonstrated experimentally at the BMET, as can be seen by comparing the predicted aerial images with actual printing results:

coherence control demo