Publications

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Found 434 Publication(s):

• 2009

  • 1. M. Siemens, Q. Li, R. Yang, K. Nelson, E. Anderson, M. Murnane, H. Kapteyn, "Measurement of quasi-ballistic heat transport across nanoscale interfaces using ultrafast coherent soft x-ray beams", Appl. Phys. Lett., 94, p. 093103, (2009)
  • 2. C. N. Anderson, P. Naulleau, "MOSAIC: a new wavefront metrology", Proc. SPIE , 7272, p. 72720B, (2009)
  • 3. P. Naulleau, C. N. Anderson, L. Baclea-an, P. Denham, S. Geroge, K. A. Goldberg, M. Goldstein, B. Hoef, R. Hudyma, G. Jones, C. Koh, B. L. Fontaine, B. McClinton, R. Miyakawa, W. Montgomery, J. Roller, T. Wallow, S. Wurm, "The SEMATECH Berkeley microfield exposure tool: learning at the 22-nm node and beyond", Proc. SPIE, 7271, p. 727101 , (2009)
  • 4. C. N. Anderson, P. N. Naulleau, "Do not always blame the photons: Relationships between deprotection blur, LER, and shot noise in EUV photoresists", JVST B., 27, p. 665, (2009)
  • 5. F. Brizuela, K. A. Goldberg, I. Mochi, S. Huh, "Collecting EUV mask images through focus by wavelength tuning", Proc. SPIE, 7271, p. 72713N, (2009)
  • 6. F. Brizuela, Y. Wang, C. A. Brewer, F. Pedaci, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, P. Naulleau, P. Wachulak, M. Marconi, D. Attwood, J. J. Rocca, C. Menoni, "Mask inspection microscopy with 13.2 nm table-top laser illumination", Opt. Lett., 34, p. 271, (2009)
  • 7. P. Naulleau, "Correlation method for the measure of mask-induced line-edge roughness in extreme ultraviolet lithography", Applied Optics, 48 , p. 3302, (2009)
  • 8. M.-Y. Im, L. Bocklage, P. Fischer, G. Meier, "Direct Observation of Stochastic Domain-Wall Depinning in Magnetic Nanowires", Phys. Rev. Lett., 102, p. 147204, (2009)
  • 9. V. S. Harutyunyan, A. P. Kirchheim, P. J. M. Monteiro, A. P. Aivazyan, P. Fischer, "Investigation of early growth of calcium hydroxide crystals in cement solution by soft X-ray transmission microscopy", Journal of Materials Science, 44, p. 962, (2009)
  • 10. F. Brizuela, Y. Wang, C. A. Brewer, F. Pedaci, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, P. Naulleau, P. Wachulak, M. Marconi, D. Attwood, J. J. Rocca, C. Menoni, "Inspection 13.2 nm table-top full-field microscope", Proc. SPIE, 7271, p. 72713, (2009)
  • 11. C. N. Anderson, P. Naulleau, "Deproteciton blur in extreme ultraviolet photoresists: Influence of base loading and post-exposure bake temperatures", J. Vac. Sci. Technol. B., 27, p. 6, (2009)
  • 12. P. Naulleau, C. Anderson, J. Chiu, K. Dean, P. Dehnam, S. George, K. Goldberg, B. Hoef, G. Jones, C. Koh, B. La Fontaine, A. Ma, W. Montgomery, D. Niakoula, J.-O. Park, T. WallowS. Wurm, "Latest results from the SEMATECH Berkeley extreme ultraviolet mircofield exposure tool", J. Vac. Sci. Technol. , 27, p. 66, (2009)
  • 13. M. E. Siemens, Q. Li, M. M. Murnane, H. C. Kapteyn, R. Yang, E. H. Anderson, K. A. Nelson, "High-frequency surface acoustic wave propagation in nanostructures characterized by coherent extreme ultraviolet beams", Appl. Phys. Lett., 94, p. 093103, (2009)

• 2008

  • 14. P. Fischer, "Soft X-ray microscopy – a powerful analytical tool to image magnetism down to fundamental length and time scales", AAPPS Bulletin, 18 , p. 12, (2008)
  • 15. K. A. Goldberg, P. Naulleau, I. Mochi, E. H. Anderson, S. B. Rekawa, C. D. Kemp, R. F. Gunion, H.-S. Han, S. Huh, "Benchmarking EUV mask inspection beyond 0.25 NA", Proc. SPIE, 7122, p. 71222E, (2008)
  • 16. E. Goulielmakis, M. Schultze, M. Hofstetter,V. S. Yakovlev, J. Gagnon,, "Single-cycle nonlinear optics", Science, 320, p. 1614, (2008)
  • 17. K.-S. Lee, S.-K. Kim, Y.-S. Yu, Y.-S. Choi, K. Y. Guslienko, H. Jung, P. Fischer, "The universal criterion for switching a magnetic vortex core in soft magnetic nanodots", Phys. Rev. Lett., 101, p. 267206, (2008)
  • 18. L. Bocklage, B. .Kruger, R. Eiselt, M. Bolte, P. Fischer, G. Meier, "Time-resolved imaging of current-induced domain-wall oscillations", Phys. Rev. B, 78, p. 180405, (2008)
  • 19. P. J. M. Monteiro, A. P. Kirchheim, S. Chae, P. Fischer, A. A. MacDowell, E. Schaible, h. R. Wenk, "Characterizing the nano an micro structure of concrete to improve its durability", Cement and Concrete Composites, (2008)
  • 20. S.-C. Gleber, J. Thieme, W. Chao, P. Fischer, "Stereo soft x-ray microscopy and elemental mapping of hematite and clay suspensions", J. Microscopy, (2008)
  • 21. H. Han, W. Cho, K. A. Goldberg, E. M. Gullikson, C.-U. Jeon, S. Wurm, "Determining the Critical Size of EUV Mask Substate Defects", SPIE, 6921, p. 69211Y, (2008)
  • 22. P. J. Cook, T. H. Shen, P. J. Grundy, M.-Y. Im, P. Fischer, S. A. Morton, and A. L. D. Kilcoyne, "Soft X-Ray Magnetic Imaging of Focused Ion Beam Lithographically Patterned Fe Thin Films", Appl. Phys. Lett., (2008)
  • 23. P. Naulleau, G. Gallatin, "The effect resist on the transfer of line -- edge roughness spatial metrics from mask to wafer", J. Vac. Sci. Technol. B., 26, p. 1903, (2008)
  • 24. H.-S. Ha, W. Cho, K. A. Goldberg, E. M. Gullikson, C.-U. Jeon, S. Wurm, , "Determining the critical size of EUV-mask substrate defects", Proc. SPIE, 6921, p. 62911Y , (2008)
  • 25. S. Mangin, T. Hauet, P. Fischer, D.H. Kim, J.B. Kortright, K. Chesnel, E. Arenholz and E.E. Fullerton, "Influence of antiferromagnetic interface exchange coupling in perpendicular anisotropy [Pt /Co]xn/TbFe bilayers", Phys Rev, 78, p. 024424, (2008)
  • 26. S-C Gleber, J Sedlmair, M Bertilson, O von Hofsten, S Heim, P, "X-ray stereo microscopy for investigation of dynamics in soil", J. Phys. Conf Series (IOP), (2008)
  • 27. P. Fischer, "Studying nanoscale magnetism and its dynamics with soft x-ray microscopy", IEEE Transactions on Magnetics, 44, p. 1900, (2008)
  • 28. D.Y. Parkinson, G. McDermott, L.D. Etkin, M.A. Le Gros, C.A. Larabell, "Quantitative 3-D imaging of eukaryotic cells using soft X-ray tomography", J. Structural Biology, 162, p. 380, (2008)
  • 29. T. Hauet, C.M. Günther, B. Pfau, M.E. Schabes, J.-U. Thiele, R.L. Rick, P. Fischer, S. Eisebitt and O. Hellwig, "Direct observation of field and temperature induced domain replication in dipolar coupled perpendicular anisotropy films", Phys Rev, 77, p. 184421, (2008)
  • 30. M.-Y. Im, D.-H. Kim, K.-D. Lee, S.H. Lee, P. Fischer, and S.-C. Shin, "Direct Real-Space Observation of Stochastic Behavior in Domain Nucleation Process on a Nanoscale", Adv. Mater, 20, p. 1750, (2008)
  • 31. A. Ma, J.-O. Park, K. Dean, S. Wurm, P. Naulleau, "Benchmarking Commercial EUVL Resists at SEMATECH", SPIE, 6921, p. 69213O, (2008)
  • 32. P. P. Naulleau, C. N. Anderson, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, D. Niakoula, B. La Fontaine, T. Wallow, "Advanced Resist Testing Using the SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool", SPIE, 6921, p. 69213N, (2008)
  • 33. C. N. Anderson, P. Naulleau, "A High-Throughput Contact-Hole Resolution Metric for Photoresists: Full-Process Sensitivity Study", SPIE, 6923, p. 69230Z, (2008)
  • 34. A. Aquila, F. Salmassi, E. M. Gullikson, "Metrologies for the Phase Characterization of Attosecond EUV Optics", Opt. Lett., 33, p. 455, (2008)
  • 35. J. S. Nation, P. P. Naulleau, "Model-Based Pupil-Fill Optimization for the SEMATECH Berkeley EUV Microfield Exposure Tool", SPIE, 6921, p. 69213J, (2008)
  • 36. C. A. Brewer, F. Brizuela, P. Wachulak, D. H. Martz, W. Chao, E. H. Anderson, D. T. Attwood, A. V. Vinogradov, I. A. Artyukov, A. G. Ponomareko, V. Kondratenko, M. C. Marconi, J. J. Rocca, C. S. Menoni, "Single Shot Extreme Ultraviolet Laser Imaging of Nanostructures with Wavelength Resolution", Opt. Lett., 33, p. 518, (2008)
  • 37. G. Gallatin, P. Naulleau, R. Brainard, D. Niakoula, K. Dean, "Resolution, LER and Sensitivity Limitations of Photoresists", SPIE, 6921, p. 69211E, (2008)
  • 38. K. A. Goldberg, S. B. Rekawa, C. D. Kemp, A. Barty, E. Anderson, P. Kearney, H. Han, "EUV mask reflectivity measurements with mircon-scale spatial resolution", SPIE, (2008)
  • 39. A. Sakdinawat, Y. Liu, "Phase Contrast Soft X-Ray Microscopy Using Zernike Zone Plates", Opt. Exp., 16, p. 1559, (2008)
  • 40. C. N. Anderson, P. P. Naulleau, "Sensitivity Study of Two High-Throughput Resolution Metrics for Photoresists", Appl. Opt., 47, p. 56, (2008)
  • 41. F. Salmassi, C. N. Anderson, P. P. Naulleau, E. M. Gullikson, "Spin-on-glass Smoothing of Diamond Turned Optics for use in the Extreme Ultraviolet Regime", SPIE, 6883, p. 68830F, (2008)
  • 42. W. Chao, E. H. Anderson, P. Fischer, D.-H. Kim, "Towards sub-10 nm resolution zone plates using the overlay Nanofabrication processes", SPIE, 6883, p. 688309, (2008)
  • 43. M.-Y. Im, D.-H. Kin, K.-D. Lee, S.-H. Lee, P. Fischer, S.-C. Shin, "Direct real-space observation of nearly stochastic behavior in magnetization reversal process on a nanoscale", Phys Rev. Lett., (2008)
  • 44. T. Hauet, C. M. Günther, O. Hovorka, A. Berger, M.-Y. Im, P. Fischer, T. Eimüller, O. Hellwig, "Field driven ferromagnetic phase nucleation and propagation in antiferromagnetically coupled multilayer films with perpendicular anisotropy films", Appl. Phys. Lett., 93, p. 042505, (2008)
  • 45. M. T. Bryan, P. W. Fry, P. J. Fischer, D. A. Allwood, "Observation of field-induced domain wall propagation in magnetic nanowires by magnetic transmission X-ray microscopy", J. Appl. Phys, 103, p. 07D909, (2008)
  • 46. P. Naulleau, E. M. Gullikson, A. Aquila, S. George, D. Niakoula, "Absolute sensitivity calibration of extreme ultraviolet photoresists", Opt. Exp., 16, p. 11519, (2008)
  • 47. M.-Y. Im, L. Bocklage, P. Fischer, G. Meier, "Direct Observation of Stochastic Domain-Wall Depinning in Magnetic Nanowires", Phys. Rev. Lett. accepted, (2008)
  • 48. P. P. Naulleau, C. N. Anderson, J. Chiu, K. Dean, P. Denham, S. George, K. A. Goldberg, B. Hoef, G. Jones, C. Koh, B. La Fontaine, A. Ma, W. Montgomery, D. Niakoula, J.-O Park, T. Wallow, S. Wurm, "Latest results from teh SEMATECH Berkeley extreme ultraviolet mircrofield exposure tool", JVST B, (2008)
  • 49. C. N. Anderson, P. P. Naulleau, "Sensitivity study of two high-throughput resolution metrics for photoresist", Appl. Opt., 47, p. 56, (2008)
  • 50. S. Marchesini, S. Boutet, A. E. Sakdinawat, M. J. Bogan, S. Bajt, A. Barty, H. N. Chapman, M. Frank, S. P. Hau-Riege, A. Szoke, C. Cui, D. A. Shapiro, M. R. Howells, J. C. H. Spence, J. W. Shaevitz, J. Y. Lee, J. Hajdu, M. M. Seibert, "Massively parallel X-ray holography", Nature Photonics, 2, p. 560, (2008)
  • 51. R. L. Sandberg, C. Song, P. W. Wachulak, D. A. Raymondson, A. Paul, B. Amirbekian, E. Lee, A. E. Sakdinawat, C. La-O-Vorakiat, M. C. Marconi, C. S. Menoni, M. M. Murnane, J. J. Rocca, H. C. Kapteyn, and J. Miao, "High numerical aperture tabletop soft x-ray diffraction microscopy with 70-nm resolution", PNAS, 105, p. 24-27, (2008)
  • 52. P. Naulleau, D. Niakoula, G. Zhang, "System-level Line-edge roughness limits in extreme ultraviolet lithography", J. Vac. Sci. Technol. B, 26, p. 1289, (2008)
  • 53. P. Naulleau, G. Gallatin, "Spatial scaling metrics of mask-induced line-edge roughness", J. Vac. Sci. Technol. B., 26, p. 1903, (2008)
  • 54. F. Kronast, R. Ovsyannikov, A. Kaiser, C. Wiemann, S.-H. Yang, A. Locatelli, D. E. Bürgler, R. Schreiber, F. Salmassi, P. Fischer, "Depth-resolved soft x-ray photoelectron emission microscopy in nanostructures via standing-wave excited photoemission", Appl. Phys. Lett., 93, p. 243116, (2008)
  • 55. S. Kasai, P. Fischer, M-Y. Im, K. Yamada, Y. Nakatani, K. Kobayashi, H. Kohno, and T. Ono, "Probing the spin polarization of current by soft X-ray imaging of current-induced magnetic vortex dynamics", Phys Rev. Lett., 101, p. 237203, (2008)
  • 56. K. A. Goldberg, S. B. Rekawa, C. D. Kemp, A. Barty, E. H. Anderson, P. Kearney, H. Han, "EUV-mask reflectivity measurements with micron-scale spatial resolution", Proc. SPIE, 6921, p. 69213U, (2008)
  • 57. C. N. Anderson, P. Naulleau, D. Niakoula, E. Hassanein, R. Brainard, G. Gallatin, K. Dean, "Influence of base and PAG on deprotection blue in EUV photoresists and some thoughts on shot noise", J. Vac. Sci. Technol. B, 26, p. 2295, (2008)
  • 58. M.-Y. Im, S.-H. Lee, D.-H. Kim, P. Fischer, S.-C. Shin, "Scaling behavior of first arrival time of a random-walking magnetic domain", Phys. Rev. Lett., 100, p. 167204, (2008)
  • 59. M. Goldstein, R. Hudyma, P. Naulleau, S. Wurm, "EUV micro-exposure tool at 0.5 NA for sub-16 nm lithography", Opt. Lett., 33, p. 2995, (2008)
  • 60. K. A. Goldberg, P. Naulleau, I. Mochi, E. H. Anderson, S. B. Rekawa, C. D. Kemp, R. F. Gunion, H.-S. Han, S. Huh, "Actinic EUV mask inspection beyond 0.25 NA", JVST B., 25, p. 2220, (2008)

• 2007

  • 61. K. A. Goldberg, V. Yashchuk, "Advanced x-ray optics metrology for nanofocusing and coherence preservation", Synchrotron Radiation News, 21, p. 11, (2007)
  • 62. D.A. Silva, P.J.M. Monteiro, "Early formation of ettringite in tricalcium aluminate – calcium hydroxide – gypsum dispersions", Journal of the American Ceramic Society, 90(2), p. 614, (2007)
  • 63. W. Gu, L.D. Etkin, M.A. Le Gros, C.A. Larabell, "X-ray tomography of Schizosaccharomyces pombe", Differentiation, 90(2), p. 529-535, (2007)
  • 64. M. T. Bryan, P. W. Fry, P. Fischer, D. A. Allwood, "Magnetic transmission x-ray microscopy of field-driven magnetization processes in Permalloy structures", , (2007)
  • 65. P. P. Naulleau, C. N. Anderson, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, D. Niakoula, B. La Fontaine, T. Wallow, "Advanced Resist Testing Using the SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool", J. Vac. Sci. Technol. B, 25, p. 2132, (2007)
  • 66. W. Cho, H.-S. Han, K. A. Goldberg, P. A. Kearney, C.-U. Jeon, "Detectability and Printability of EUVL Mask Blank Defects for the 32 nm HP Node", SPIE, 6730, p. 673013, (2007)
  • 67. C. N. Anderson, P. P. Naulleau, "Dual-Domain Scanning Illuminator for the Berkeley Micro Exposure Tool ", J. Vac. Sci. Technol. B, 25, p. 2151, (2007)
  • 68. F. Salmassi, E. M. Gullikson, E. H. Anderson, P. P. Naulleau, "Multilayer Phase-Only Diffraction Gratings: Fabrication and Application to EUV Optics", J. Vac. Sci. Technol. B, 22, p. 2055, (2007)
  • 69. T. Liang, E. Ultanir, G. Zhang, S.-J. Park, E. Anderson, E. Gullikson, P. Naulleau, F. Salmassi, P. Mirkarimi, E. Spiller, S. Baker, "Growth and Printability of Multilayer Phase Defects on EUV Mask Blanks", J. Vac. Sci. Technol. B, 25, p. 2098, (2007)
  • 70. P. Fischer, D.-H. Kim, B. L. Mesler, W. Chao, A. E. Sakdinawat, E. H. Anderson, "Exploring nanomagnetism with soft X-ray microscopy", Surface Science, 601(20), p. 4680, (2007)
  • 71. K. A. Goldberg, P. P. Naulleau, A. Barty, S. B. Rekawa, C. D. Kemp, R. F. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, H.-S. Han, "Performance of Actinic EUVL Mask Imaging Using a Zoneplate Microscope", SPIE, 6730, p. 67305E, (2007)
  • 72. P. P. Naulleau, J. P. Cain, "Experimental and Model-Based Study of the Robustness of Lind-Edge Roughness Metric Extraction in the Presence of Noise", J. Vac. Sci. Technol. B, 25, p. 1647, (2007)
  • 73. A. Sakdinawat, Y. Liu, "Soft X-ray Microscopy Using Spiral Zone Plates", Opt. Lett., 32, p. 2635, (2007)
  • 74. C. N. Anderson, P. P. Naulleau, "Sensitivity study of reliable, high-throughput resolution metrics for photoresists", App. Opt., (2007)
  • 75. R. Soufli, R. M. Hudyma, E. Spiller, E. M. Gullikson, M. A. Schmidt, J. C. Robinson, S. L. Baker, C. C. Walton, J. S. Taylor, "Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography", Appl. Opt. , 46, p. 3736, (2007)
  • 76. S. Bajt, H. N. Chapman, E. Spiller, S. Hau-Riege, J. Alameda, A. J. Nelson, C. C. Walton, B. Kjornrattanawanich, A. Aquila, F. Dollar, E. Gullikson, C. Tarrio, S. Grantham, "Multilayers for next generation x-ray sources ", SPIE, 6586, p. 18, (2007)
  • 77. I. Guhr, S. van Dijken, G. Malinowski, P. Fischer, F. Springer, O. Hellwig, M. Albrecht, "Investigation of Magnetization Reversal in Exchange Biased Nanocap Arrays", J. Phys. D: Appl. Phys., 40, p. 3005, (2007)
  • 78. P. Naulleau, F. Salmassi, E. Gullikson, J. Liddle, "Design and fabrication of a high-efficiency extreme ultraviolet binary phase-only computer-generated hologram", Appl. Opt. , 46, p. 2581, (2007)
  • 79. G. Meier, M. Bolte, R. Eiselt, B. Kruger, D.-H. Kim, P. Fischer, "Direct imaging of current driven stochastic domain-wall motion and deformation", Phys. Rev. Lett. , 98, p. 187202, (2007)
  • 80. P. Fischer, "Towards a deeper insight into strongly correlated electron systems the symbiosis between experiment and theory ", J. Phys. Condensed Matter, 19, p. 181002, (2007)
  • 81. S. P. Hau-Riege, H. N. Chapman, J. Krzywinski, R. Sobierajski, S. Bajt, R. A. London, M. Bergh, C. Caleman, R. Nietubyc, L. Juha, J. Kuba, E. Spiller, S. Baker, R. Bionta, K. S. Tinten, N. Stojanovic, B. Kjornrattanawanich, E. Gullikson, E. Plonjes, S. To, "Subnanometer-scale measurements of the interaction of ultrafast soft X-ray free-electron-laser pulses with matter", Phys. Rev. Lett. , 98, p. 145502, (2007)
  • 82. M. S. Pierce, C. R. Buechler, L. B. Sorensen, S. D. Kevan, E. A. Jagla, J. M. Deutsch, T. Mai, O. Narayan, J. E. Davies, K. Liu, G. T. Zimanyi, H. G. Katzgraber, O. Hellwig, E. E. Fullerton, P. Fischer, J. B. Kortright, "Disorder-induced magnetic memory: Experiments and theories", Phys. Rev. B, 75, p. 144406, (2007)
  • 83. P. P. Naulleau, C. N. Anderson, B. LaFontaine, T. Wallow, "Lithographic metrics for the determination of intrinsic resolution limits in EUV resists ", SPIE, 6517, p. "65172N", (2007)
  • 84. P. Naulleau, C. Anderson, S. Horne, "Extreme ultraviolet interference lithography with incoherent light", SPIE, 6517, p. "65172T", (2007)
  • 85. G. Gallatin, P. Naulleau, R. Brainard, "Fundamental limits to EUV photoresists: what resolution, LER, and sensitivity can be achieved ", SPIE, 6519, p. 651911, (2007)
  • 86. P. P. Naulleau, C. N. Anderson, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, B. LaFontaine, T. Wallow, "Recent results from the Berkeley 0.3-NA EUV microfield exposure tool", SPIE, 6517, p. "65170V", (2007)
  • 87. K. A. Goldberg, A. Barty, P. Seidel, K. Edinger, R. Fettig, P. Kearney, H. Han, O. R. Wood II, "EUV and non-EUV inspection of reticle defect repair sites ", SPIE, 6517, p. "65170C", (2007)
  • 88. H. Han, K. A. Goldberg, A. Barty, E. M. Gullikson, Y. Ikuta, T. Uno, O. R. Wood II, S. Wurm, "EUV MET printing and actinic imaging analysis on the effects of phase defects on wafer CDs ", SPIE, 6517, p. "65170B", (2007)
  • 89. L.J. Heyderman, F. Nolting, S. Czekaj, D.-H. Kim, P. Fischer, "Cobalt antidot arrays on membranes: fabrication and investigation with transmission x-ray microscopy", Journal of Magnetism and Magnetic Materials, 316, p. 99, (2007)
  • 90. W. Cho, P. Kearney, E. Gullikson, A. Jia, T. Tamura, A. Tajima, H. Kusunose, C. U. Jeon, "Inspection with the M7360 at the SEMATECH Mask Blank Development Center ", SPIE, 6517, p. "65170D", (2007)
  • 91. P. Naulleau, F. Salmassi, E. Gullikson, E. Anderson, "Holographic optical elements for the extreme-ultraviolet regime", SPIE, 6462, p. "64620S", (2007)
  • 92. P. Fischer, D.-H. Kim, B. L. Mesler, W. Chao, E. H. Anderson, "Magnetic soft X-ray microscopy: Imaging spin dynamics at the nanoscale", J. Magn. and Magn. Mat., 310, p. 2689, (2007)
  • 93. B. L. Mesler, P. Fischer, W. Chao, E. H. Anderson, D.-H. Kim, "Soft X-ray Imaging of Spin Dynamics at High Spatial and Temporal Resolution", J. Vac. Sci. Technol. B, 25, p. 2598, (2007)
  • 94. E. Gullikson, D. Attwood, "Reference data for the extreme ultraviolet spectral region (chapter in Extreme Ultraviolet Lithography, V. Bakshi, ed.)", SPIE Press, (2007)

• 2006

  • 95. G. Vaschenko, A.G. Etxarri, C. S. Menoni, J. J. Rocca, O. Hemberg, S. Bloom, W. Chao, E. H. Anderson, D. T. Attwood, Y. Lu, B. Parkinson, "Nanometer-scale ablation with a table-top soft x-ray laser ", Opt. Lett. , 31, p. 3615, (2006)
  • 96. Y. Liu, Y. Wang, M. A. Larotonda, B. M. Luther, J. J. Rocca, D. T. Attwood, "Spatial coherence measurements of a 13.2 nm transient nickel-like cadmium soft x-ray laser pumped at grazing incidence ", Opt. Exp. , 14, p. 12872, (2006)
  • 97. J. J. Rocca, H. Kapteyn, D. Attwood, M. M. Murnane, C. S. Menoni, E. H. Anderson, "Tabletop lasers in the extreme ultraviolet ", Optics & Photonics News, 17, p. 30, (2006)
  • 98. D. L. Olynick, A. V. Tivanski, M. K. Gilles, T. Tyliszczak, F. Salmassi, J. A. Liddle, K. Liang, S. R. Leone, "Scanning x-ray microscopy investigations into the electron beam exposure mechanism of hydrogen silsesquioxane resists ", J. Vac. Sci. Technol. B, 24, p. 3048, (2006)
  • 99. A. Aquila, F. Salmassi, F. Dollar, Y. Liu, E. M. Gullikson, "Developments in realistic design for aperiodic Mo/Si multilayer mirrors", Opt. Exp. , 14, p. 10073, (2006)
  • 100. D. Attwood, "Nanotomography comes of age ", Nature, 442, p. 642, (2006)
  • 101. D. Attwood, W. Chao, E. Anderson, J. A. Liddle, B. Harteneck, P. Fischer, G. Schneider, M. Le Gros, C. Larabell, "Imaging at High Spatial Resolution: Soft X-Ray Microscopy to 15 nm", J. Biomed. Nanotech. , 2, p. 75, (2006)
  • 102. K. A. Goldberg, A. Barty, Y. Liu, P. Kearney, Y. Tezuka, T. Terasawa, J. S. Taylor, H.-S., Han, O. R. Wood, "Actinic inspection of EUV programmed multilayer defects and cross-comparison measurements ", J. Vac. Sci. Technol. B , 24, p. 2824, (2006)
  • 103. A. R. Neureuther, R. F. W. Pease, L. Yuan, K. B. Parizi, H. Esfandyarpour, W. J. Poppe, J. A. Liddle, E. H. Anderson, "Shot noise models for sequential processes and the role of lateral mixing", J. Vac. Sci. Technol. B , 24, p. 1908, (2006)
  • 104. V. V. Yashchuk, E. M. Gullikson, M. R. Howells, S. C. Irick, A. A. MacDowell, W. R. McKinney, F. Salmassi, T. Warwick, P. P. Metz, T. W. Tonnessen, "Surface roughness of stainless-steel mirrors for focusing soft x-rays ", Appl. Opt. , 45, p. 4833, (2006)
  • 105. P. Fischer, D.-H. Kim, B.-S. Kang, W. Chao and E. H. Anderson, "Achievements and Perspectives of Magnetic Soft X-ray Transmission Microscopy", IPAP Conf. Series, 7, p. 4, (2006)
  • 106. B.-S. Kang, P. Fischer, D.-H. Kim, D. Attwood, E. Anderson, and G. Cho, "Bending Magnet X-ray Polarization Modulation for Magnetic Full-field Soft X-ray Transmission Microscopy", IPAP Conf. Series, 7, p. 288, (2006)
  • 107. R.W. Schoenlein and P. Fischer, "Ultrafast X-ray Science at the ALS", Synch. Rad. News, 19, p. 12, (2006)
  • 108. P. Fischer, D.-H. Kim, B. Kang, W. Chao, E. H. Anderson, "Magnetic microstructures and their dynamics studied by X-ray microscopy ", Micron , 37, p. 296, (2006)
  • 109. F. Salmassi, P. P. Naulleau, E. M. Gullikson, D. L. Olynick, J. A. Liddle, "Extreme ultraviolet binary phase gratings: Fabrication and application to diffractive optics", J. Vac. Sci. Technol. A , 24, p. 1136, (2006)
  • 110. L. Heyderman, F. Nolting, D. Backes, S. Czekaj, L. Lopez-Diaz, M. Klui, U. Rdiger, C. A. F. Vaz, J. A. C. Bland, R. J. Matelon, U. G. Volkmann, P. Fischer, "Magnetization reversal in cobalt antidot arrays", Phys. Rev. B , 73, p. 214429, (2006)
  • 111. G. Vaschenko, C. Brewer, F. Brizuela, Y. Wang, M. A. Larotonda, B. M. Luther, M. C. Marconi, J. J. Rocca, C. S. Menoni, E. H. Anderson, W. Chao, B. D. Harteneck, J. A. Liddle, Y. Liu, D. T. Attwood, "Sub-38 nm resolution tabletop microscopy with 13 nm wavelength laser light", Opt. Lett., 31, p. 1214, (2006)
  • 112. P. P. Naulleau, C. Rammeloo, J. P. Cain, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, B. La Fontaine, A. R. Pawloski, C. Larson, G. Wallraff, "Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists", SPIE, 6151, p. 289, (2006)
  • 113. C. Chang, A. Sakdinawat, P. Fischer, E. Anderson, D. Attwood, "Single-element Objective Lens for Soft-X-Ray Differential Interference Contrast Microscopy", Opt. Lett. , 31, p. 1564, (2006)
  • 114. K. A. Goldberg, P. P. Naulleau, "Diffractive optical element for extreme ultraviolet wavefront control ", U.S. Patent No. , 7,027,226, (2006)
  • 115. S-H. Yang, B. S. Mun, N. Mannella, A. Nambu, B. C. Sell, S. B. Ritchey, F. Salmassi, A. Shick, S. S. P. Parkin, C. S. Fadley, "Relationship of tunnelling magnetoresistance and buried-layer densities of states as derived from standing-wave excited photoemission", J. Phys: Condensed Matter , 18, p. L259, (2006)
  • 116. F. Eriksson, N. Ghafoor, F. Schafers, E. M. Gullikson, J. Birch, , "Interface engineering of short-period Ni/V multilayer X-ray mirrors", Thin Solid Films, 500, p. 84, (2006)
  • 117. F. Salmassi, P. P. Naulleau, E. M. Gullikson, "Spin-on-glass coatings for the generation of superpolished substrates for use in the extreme-ultraviolet region", Appl. Opt. , 45, p. 2404, (2006)
  • 118. D. Kim, P. Fischer, W. Chao, E. Anderson, S. Choe, M. Im, S. Shin, "Magnetic Soft X-Ray Microscopy at 15nm Resolution Probing Nanoscale Local Magnetic Hysteresis", J. Appl. Phys., 99, p. 08H303, (2006)
  • 119. J. Fassbender, L. Bischoff, R. Mattheis, P. Fischer, "Magnetic domains and magnetization reversal of ion-induced magnetically patterned Ruderman-Kittel-Kasuya-Yoshida-coupled Ni81Fe19/Ru/Co90Fe10 films", J. Appl. Phys., 99, p. 08G301, (2006)
  • 120. J. Cain, P. Naulleau, E. Gullikson, C. Spanos, "Lithographic characterization of the flare in the Berkeley 0.3-numerical aperture extreme ultraviolet microfield optic", J. Vac. Sci. & Technol. B , 24, p. 1234, (2006)
  • 121. M. Bolte, R. Eiselt, G. Meier, D.-H. Kim, P. Fischer, "Real space observation of dipolar interaction in arrays of Fe microelements", J. Appl. Phys. , 99, p. 08H301, (2006)
  • 122. P. Naulleau, "An extended surface parallel coating inspection method", U.S. Patent No., p. 7,016,030, (2006)
  • 123. P. Naulleau, J. Cain, K. Dean, K. Goldberg, " Lithographic Characterization of Low-Order Aberrations in the Berkeley MET Tool", Fourth International EUVL Symposium, (2006)
  • 124. P. Naulleau, J. Cain, K. Goldberg, "Lithographic characterization of the spherical error in an EUV optic using a programmable pupil fill illuminator", Appl. Opt. , 45, p. 1957, (2006)
  • 125. P. Naulleau, J. Cain, K. Dean, K. A. Goldberg, "Lithographic Characterization of Low-Order Aberrations in a 0.3-NA EUV Microfield Exposure Tool", SPIE , 6151, (2006)
  • 126. T. Schenkel, J. A. Liddle, J. Bokor, A. Persaud, S. J. Park, J. Shangkuan, C. C. Lo, S. Kwon, S. A. Lyon, A. M. Tyryshkin, I. W. Rangelow, Y. Sarov, D. H. Schneider, J. Ager, R. de Sousa, "Strategies for integration of donor electron spin qubits in silicon", Micro. Eng. , 83, p. 1814, (2006)
  • 127. B. La Fontaine, A. R. Pawloski, O. Wood, Y. Deng, H. J. Levinson, P. Naulleau, P. E. Denham, E. Gullikson, B. Hoef, C. Holfeld, C. Chovino, F. Letzkus, "Demonstration of phase-shift masks for extreme-ultraviolet lithography", SPIE, 6151, p. 69, (2006)
  • 128. K. Rosfjord, C. Chang, R. Miyakawa, H. Barth, D. Attwood, "Direct index of refraction measurements at extreme-ultraviolet and soft-x-ray wavelength", Appl. Opt., 45, p. 1730, (2006)
  • 129. M.C. Garci Juenger, P.J.M. Monteiro, and E.M. Gartner, "In situ imaging of ground granulated blast furnace slag hydration", Journal of Material Science, 41(21), p. 7074, (2006)
  • 130. M. S. Pierce, C. R. Buechler, L. B. Sorensen, S. D. Kevan, E. A. Jagla, J. M. Deutsch, T. Mai, O. Narayan, J. E. Davies, K. Liu, G. T. Zimanyi, H. G. Katzgraber, O. Hellwig, E. E. Fullerton, P. Fischer, J. B. Kortright, "Disorder-induced magnetic memory: Experiments and theories", Phys. Rev. B, 75, p. 144406, (2006)
  • 131. P. Fischer, D.H. Kim, W. Chao, J.A. Liddle, E.H. Anderson, D.T. Attwood, "Soft X-ray microscopy of nanomagnetism", Materials Today, 9, p. 26, (2006)
  • 132. D.A. Silva and P.J.M. Monteiro, "The influence of polymers on the hydration of portland cement phases analyzed by soft X-ray transmission microscopy", Cement and Concrete Research, 36(8), p. 1501, (2006)
  • 133. G. Denbeaux, P. Fischer, F. Salmassi, K. Dunn, J. Evertsen, "Reflection Mode Imaging with High Resolution X-ray Microscopy", IPAP Conf. Series , 7, p. 375-386, (2006)
  • 134. W. Chao, B. D. Harteneck, J. A. Liddle, E. H. Anderson and D. T. Attwood, "Zone Plate Microscopy to Sub-15 nm Spatial Resolution with XM-1 at the ALS", IPAP Conf. Series , 7, p. 4-6, (2006)
  • 135. L. J. Heyderman, S. Czekaj, F. Nolting, E. Mller, P. Fischer, Ph. Gasser, L. Lpez-Daz, "Photoemission electron microscopy study of remanent magnetic domain states in ferromagnetic wedge films deposited on substrates with micrometer-sized square plateaus", J. Appl. Phys., 99, p. 63904, (2006)
  • 136. E. H. Anderson, "Specialized Electron Beam Nano-Lithography for EUV and X-Ray Diffractive Optics", IEEE J. Quant. Electr. , 42, p. 27, (2006)
  • 137. P. Fischer, "Studies of Magnetic Microstructures with Soft X-ray Transmission Microscopy", IEEE J. Quant. Electr. , 42, p. 36, (2006)
  • 138. P. Fischer, D. H. Kim, W. Chao, J. A. Liddle, E. H. Anderson, D. T. Attwood, "Soft X-ray microscopy of nanomagnetism", Materials today , 9, p. 26, (2006)
  • 139. W. Chao, B. D. Harteneck, E. H. Anderson, D. Attwood, J. A. Liddle, "New Nanofabrication Technique Using Overlay for 15-nm Zone Plate", SPIE, 6110, p. 61100D, (2006)
  • 140. K. Goldberg, "Testing EUV optics with EUV light: If you can measure it, you can make it", SPIE Newsroom: Optical Design & Engineering, (2006)
  • 141. E. M. Gullikson, F. Salmassi, A. L. Aquila, F. Dollar, "Progress in short period multilayer coatings for water window applications", PXRMS meeting, Japan , (2006)
  • 142. D. Attwood, W. Chao, E. Anderson, J.A. Liddle, B. Harteneck, P. Fischer, G. Schneider, M.L. Gros and C. Larabell, "Imaging at High Spatial Resolution: Soft X-Ray Microscopy to 15 nm", J. Biomed. Nanotech., (2006)
  • 143. P. Naulleau, J. Cain, E. Anderson, K. Dean, P. Denham, K. Goldberg, B. Hoef , K. Jackson, "Extreme ultraviolet lithography capabilities at the advanced light source using a 0.3-NA optic", IEEE J. Quan. Electr., 42, p. 44, (2006)
  • 144. L. J. Heyderman, F. Nolting, S. Czekaj, D.-H. Kim, P. Fischer, "Cobalt antidot arrays on membranes: fabrication and investigation with transmission x-ray microscopy", JMMM, (2006)
  • 145. P. B. Mirkarimi, E. Spiller, S. L. Baker, D. G. Stearns, J. C. Robinson, D. L. Olynick, F. Salmassi, J. A. Liddle, T. Liang, A. R. Stivers , "A Silicon-Based, Squential Coat-andEtch Process to Fabricate Nearly Perfect Substrate Surfaces", J. Nanosci. And Nanotech., 6, p. 28, (2006)
  • 146. D. Attwood, "Nanotomography comes of age", Nature, 422, p. 642, (2006)

• 2005

  • 147. M. D. Shumway, P. Naulleau, K. A. Goldberg, J. Bokor, "Measuring line roughness through aerial image contrast variation using coherent extreme ultraviolet spatial filtering techniques", J. Vac. Sci. & Technol. B +, 23, p. 2844, (2005)
  • 148. G. Vaschenko, F. Brizuela, C. Brewer, M. Grisham,Y. Wang, M. A. Larotonda, B. M. Luther, C. S. Menoni, M. Marconi, J. J. Rocca, W. L. Chao, J. A. Liddle, E. H. Anderson, D. T. Attwood, A. V. Vinogradov, I. A. Artioukov,Y. P. Pershyn, V. V. Kondratenko, "Nano-imaging with compact extreme ultraviolet laser sources", SPIE, 5752, p. 375, (2005)
  • 149. Y. Muramatsu, M. Yamashita, M. Motoyama, M. Hirose, J. D. Denlinger, E. M. Gullikson, R. C. C. Perera, "Characterization of surface carbon films on weathered Japanese roof tiles by soft X-ray spectroscopy", , X-Ray Spectrometry , 34, p. 509, (2005)
  • 150. P. Naulleau, K. Goldberg, E. Anderson, K. Dean, P. Denham, J. Cain, B. Hoef, K. Jackson, "Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source", J. Vac. Sci. & Technol. B, 23, p. 2840, (2005)
  • 151. H. Takenaka, S. Ichimaru, E. M. Gullikson, "EUV beam splitter for use in the wavelength region around 6 nm", J. Electr. Spectr. and Rel. Phenom., 144-147, p. 1043, (2005)
  • 152. K. A. Goldberg, M. E. Teyssier, J. A. Liddle, "EUV Focus Sensor Design Optimization", J. Vac. Sci. Technol. B, 23, p. 2885, (2005)
  • 153. Y.-D. Chuang, J. Pepper, W. McKinney, Z. Hussain, E. Gullikson, P. Batson, Q. Dong, M. Z. Hasan, "High-resolution soft X-ray emission spectrograph at advanced light source", J. Phys. Chem. Sol., 66, p. 2173, (2005)
  • 154. V. Farys, C. Charpin-Nicolle, M. Richard, J. Robic, V. Muffato, E. Quesnel, S. Postnikov, P. Schiavone, P. Naulleau, "Printability of nonsmoothed buried defects in extreme ultraviolet lithography mask blanks", J. Vac. Sci. & Technol. B , 23, p. 2860, (2005)
  • 155. K. A. Goldberg, "Method and Apparatus for Inspecting EUV Mask Blank", U.S. Patent No. , 6,963,395, (2005)
  • 156. P.-Y. Yan, E. Spiller, E. Gullikson, S. Hill, "Evaluation of alternative capping layers for EUVL mask ML blank", SPIE, 5992, p. 1168, (2005)
  • 157. B. La Fontaine, A. Pawloski, O. Wood, H. Levinson, P. Denham, E. Gullikson, B. Hoef, P. Naulleau, C. Holfeld, C. Chovino, F. Letzkus, "Printing EUV Phase-shift Masks using the 0.3NA Berkeley Micro-exposure Tool", 4th International EUVL Symposium, (2005)
  • 158. J. Cain, P. Naulleau, P. Denham, E. Gullikson, B. Hoef, C. Spanos, "Lithographic measurement of EUV flare in the Berkeley MET optic", 0, (2005)
  • 159. K.-Y. Tsai, E. Gullikson, P. Kearney, A. Stivers, "On the sensitivity improvement and cross-correlation methodology for confocal EUV mask blank defect inspection tool flee", SPIE, 5992, p. 1178, (2005)
  • 160. B. S. Kang, D. H. Kim, E. Anderson, P. Fischer, G. Cho, "Polarization modulated magnetic soft X-ray transmission microscopy", Appl. Phys. Lett. , 98, p. 93907, (2005)
  • 161. A. Barty, Y. Liu, K. A. Goldberg, E. M. Gullikson, J. S. Taylor, O. R. Wood II, "Actinic inspection of multilayer coated EUV masks at the ALS", Fourth International (EUVL) Symposium, (2005)
  • 162. Y. Liu, A. Barty, K. Goldberg, E. Gullikson, J. S. Taylor, O. Wood, "At-wavelength imaging of EUV masks at the ALS", SPIE, (2005)
  • 163. A. Barty, Y. Liu, E. Gullikson, J. S. Taylor, O. R. Wood II, "Actinic inspection of multilayer defects on EUV masks", SPIE, 5751, p. 651, (2005)
  • 164. D. L. Olynick, J. A. Liddle, I. W. Rangelow, "Profile evolution of Cr masked featured undergoing HBr-inductively coupled plasma etching for use in 25 nm silicon nanoimprint templates", J. Vac. Sci. Technol. B, 23, p. 2073, (2005)
  • 165. P. Naulleau, J. Cain, K. Goldberg, "Lithographic characterization of the field dependent astigmatism and alignment stability of a 0.3 numerical aperture EUV microfield optic", , J. Vac. Sci. & Technol. B , 23, p. 2003, (2005)
  • 166. F. Brizuela, G. Vaschenko, C. Brewer, M. Grisham, C. S. Menoni, H. Mancini, M. C. Marconi, J. J. Rocca, W. Chao, J. A. Liddle, E. H. Anderson, D. T. Attwood, A. V. Vinogradov, I. A. Artioukov, Y. P. Pershyn, V. V. Kondratenko, "Nanometer-scale imaging with compact soft x-ray lasers", SPIE, 5919, p. 179, (2005)
  • 167. P. Naulleau, "Holographic illuminator for synchrotron-based projection lithography systems", U.S. Patent No., 6,927,887, (2005)
  • 168. G. Vaschenko, F. Brizuela, C. Brewer, M. Grisham, H. Mancini, C. S. Menoni, M. C. Marconi, J. J. Rocca, W. Chao, J. A. Liddle, E. H. Anderson, D. T. Attwood, A. V. Vinogradov, I. A. Artioukov, Y. P. Pershyn, V. V. Kondratenko, "Nanoimaging with a Compact Extreme Ultraviolet Laser", Opt. Lett. , 30, p. 2095, (2005)
  • 169. K. A. Goldberg, P. Naulleau, S. Rekawa, P. Denham, J. A. Liddle, E. M. Gullikson, K. Jackson, E. Anderson, J. Taylor, G. Sommargren, H. Chapman, D. Phillion, M. Johnson, A. Barty, R. Soufli, E. Spiller, C. C. Walton, S. Bajt, "Ultra-high-accuracy optical testing: creating diffraction-limited short-wavelength optical systems", SPIE, 5900, p. 114, (2005)
  • 170. P. Mercere, S. Bucourt, G. Cauchon, D. Douillet, G. Dovillaire, K. A. Goldberg, M. Idir, X. Levecq, T. Moreno, P. P. Naulleau, S. Rekawa, P. Zeitoun, "X-ray beam metrology and x-ray optic alignment by Hartmann wavefront sensing", SPIE, 5921, p. 63, (2005)
  • 171. V. V. Yashchuk, S. C. Irick, E. M. Gullikson, M. R. Howells, A. A. MacDowell, W. R. McKinney, F. Salmassi, T. Warwick, "Cross-check of different techniques for two-dimensional power spectral density measurements of X-ray optics", SPIE , 5921, p. 59210G-1, (2005)
  • 172. R. Soufli, D. L. Windt, J. C. Robinson, S. L. Baker, E. Spiller, F. J. Dollar, A. L. Aquila, E. M. Gullikson, B. Kjornrattanawanich, J. F. Seely, L. Golub, "Development and testing of EUV multilayer coatings for the atmospheric imaging assembly instrument aboard the Solar Dynamics Observatory", SPIE, 5901, p. 173, (2005)
  • 173. P. Fischer, D.-H. Kim, W. Chao, E. H. Anderson, "Magnetic X-ray microscopy: Imaging nanomagnetism with 15nm spatial and sub-ns time resolution", Bioimages, (2005)
  • 174. G. Denbeaux, P. Fischer, F. Salmassi, K. Dunn, J. Evertsen, "Reflection Mode Imaging with High Resolution X-ray Microscopy", XRM2005 (The 8th International Conference on X-ray Microscopy), Egret Himeji, Japan, (2005)
  • 175. P. Naulleau, E. Anderson, K. Dean, P. Denham, K. Goldberg, B. Hoef, K. Jackson, "Advanced 0.3-NA EUV lithography capabilities at the ALS", NGL, Tokyo, Japan, (2005)
  • 176. D.-H. Kim, M.-Y. Im, S.-B. Choe, P. Fischer, and S.-Ch Shin, "Statistical Analysis of Magnetization Reversal Dynamics in Disordered Ferromagnetic Films", Jap. J. Appl. Phys, (2005)
  • 177. A. Puzic, H. Stoll, P. Fischer, B. v. Waeyenberge, J. Raabe, G. Denbeaux, T. Haug, D. Weiss, G. Schütz, "Implementing sub-ns time resolution into magnetic X-ray microscopies", Physica Scripta, T115, p. 1029, (2005)
  • 178. F. Salmassi, P. P. Naulleau, E. M. Gullikson, D. L. Olynick, J. A. Liddle, "Extreme ultraviolet binary phase gratings: Fabrication and application to diffractive optics", J. Vac. Sci. Technol. A , 24, p. 1136, (2005)
  • 179. W. Chao, B. H. Harteneck, J. A. Liddle, E. H. Anderson, D. T. Attwood, "Soft x-ray microscopy at a spatial resolution better than 15 nm", Nature, 435, p. 1210, (2005)
  • 180. M. Mogi, Y. Inoue, T. Yamamoto, I. Tanaka, P. Nachimuthu, R. C. C. Perera, "Near-edge X-ray absorption fine structure of PdO at O K-edge", Japanese J. Appl. Phys. , 44, p. 4057, (2005)
  • 181. A. Puzic, B. Van Waeyenberge, K. W. Chou, P. Fischer, H. Stoll, G. Schtz, T. Tyliszczak, K. Rott, H. Brckl, G. Reiss, I. Neudecker, T. Haug; M. Buess, C. H. Back, "Spatially resolved ferromagnetic resonance: Imaging of ferromagnetic eigenmodes", J. Appl. Phys., 97, p. 10E704, (2005)
  • 182. K. A. Goldberg, M. E. Teyssier, J.A. Liddle, "EUV Focus Sensor: Design and Modeling", SPIE, 5751, p. 33, (2005)
  • 183. F. Brizuela, G. Vaschenko, C. Brewer, M. Grisham, C. S. Menoni, M. C. Marconi, J. J. Rocca, W. Chao, J. A. Liddle, E. H. Anderson, D. T. Attwood, A. V. Vinogradov, I. A. Artioukov, Y. P. Pershyn, V. V. Kondratenko, "Reflection Mode Imaging with Nanoscale Resolution Using a Compact Extreme Ultraviolet Laser", Opt. Exp., 13, p. 3983, (2005)
  • 184. J. P. Cain, P. Naulleau, C. J. Spanos, "Resist-based measurement of the contrast transfer function in a 0.3-NA EUV microfield optic", SPIE, 5751, p. 741, (2005)
  • 185. G.- Y. Jung, Z. Li, W. Wu, S. Ganapathiappan, X. Li, D. L. Olynick, S. Y. Wang, W. M. Tong, R. S. Williams, "Improved pattern transfer in nanoimprint lithography at 30 nm half-pitch by substrate-surface fucktionalization", Langmuir, 21, p. 6127, (2005)
  • 186. G. Vaschenko, F. Brizuela, C. Brewer, M. Grisham, H. Mancini, C. S. Menoni, M. Marconi, J. J. Rocca, W. Chao, A. Liddle, E. Anderson, D. Attwood, A. V. Vinogradov, I. A. Artioukov, Y. P. Pershyn, V. V. Kondratenko, "Nano-scale imaging with a compact EUV laser", QELS, (2005)
  • 187. P. Naulleau, K. A. Goldberg, E. Anderson, J. P. Cain, "EUV microexprosures at the ALS using 0.3-NA MET projection optics", SPIE, (2005)
  • 188. T. Koehler, R. Brainard, P. Naulleau, D. v. Steenwinckel, J. Lammers, K. Goldberg, J. Machevich, P. Trefonas, "Performance of EUV photoresists on the ALS micro exposure tool", SPIE, 5753, p. 754, (2005)
  • 189. J. P. Cain, P. Naulleau, C. J. Spanos, "Lithographic measurement of EUV flare in the 0.3-NA Micro Exposure Tool optic at the Advanced Light Source", SPIE, 5751, p. 301, (2005)
  • 190. D.-H. Kim, B. Kang, W. Chao, P. Fischer, E. Anderson, S.-B. Choe, M.-Y. Im, S.-C. Shin, "Direct Spatial-temporal Observation of Barkhausen Avalanche in Low Dimensional Ferromagnetic System", SPIE, 5843, p. 40, (2005)
  • 191. J. P. Cain, P. Naulleau, C. J. Spanos, "Modeling of EUV photoresists with a resist point spread function", SPIE, 5751, p. 1101, (2005)
  • 192. E. M. Gullikson, E. Tejnil, K. -Y. Tsai, A. R. Stivers, H. Kusunose, "Modeling the Defect Inspection Sensitivity of a Confocal Microscope", SPIE , 5751, p. 1223, (2005)
  • 193. Y. Liu, A. Barty, E. Gullikson, J. S. Taylor, J. A. Liddle, O. Wood, "A dual-mode actinic EUV mask inspection tool", SPIE, 5751, p. 660, (2005)
  • 194. J. Cain, P. Naulleau, C. Spanos, "Critical dimension sensitivity to post exposure bake temperature variations in EUV photoresists", SPIE, 5751, p. 1092, (2005)
  • 195. M. Bolte, R. Eiselt, T. Eimuller, P. Fischer, G. Meier, "Micromagnetic simulation as a bridge between magnetic-force and magnetic-transmission X-ray microscopy", J. Magn. Magnetic. Mat, 290-291, p. 723, (2005)
  • 196. E. Anderson, P. Naulleau, "Method of fabricating reflection-mode EUV duffusers", U.S. Patent No., 6,861,273, (2005)
  • 197. H. Takenaka, S. Ichimaru, T. Ohchi, E. M. Gullikson, "Soft-X-ray reflectivity and heat resistance of SiC/Mg multilayer", J. Elect. Spectr. Relat. Phenon., 144-147, p. 1047, (2005)
  • 198. M. Watanabe, B. Sell, S.-H. M. Yang, M. Bongjin, M. Norman, P. Long, R. Stephenie, N. Akira, F. Salmassi, J. Guo, J. Kortright, S. S. P, Parkin, C. Fadley, "Buried-interface characterization in magnetic nanostructures using standing wave-excited x-ray emission and resonant inelastic x-ray scattering", Ameri. Phys. Soc., APS March Meeting, (2005)
  • 199. P. Naulleau, "Apparatus for generating partially coherent radiation", U.S. Patent No., 6,859,263, (2005)
  • 200. H. Takenaka, S. Ichimaru, K. Nagai, T. Ohchi, H. Ito, E. M. Gullikson, "Multilayer mirrors for u-XPS using a Schwarzschild objective", Surface Interf. Ana., 37, p. 181, (2005)
  • 201. P. Fischer, M.-Y. Im, T. Eimuller, G. Schutz, S.-C. Shin, "Magnetization reversal behavior of nanogranular CoCrPt alloy thin films studied with magnetic transmission X-ray microscopy", J. Magn. Magnet. Mat., 286, p. 23, (2005)
  • 202. S. Bajt, Z. R. Dai, E. J. Nelson, M. A. Wall, J. Alameda, N. Nguyen, S. Baker, J. C. Robinson, J. S. Taylor, M. Clift, A. Aquila, E. M. Gullikson, N. V. G. Edwards, "Oxidation resistance of ru-capped EUV multilayers ", SPIE, 5751, p. 118, (2005)
  • 203. D.A. Silva and P.J.M. Monteiro, "Analysis of C3A hydration using soft X-rays transmission microscopy: Effect of EVA copolymer", Cement and Concrete Research, 35(10), p. 2026, (2005)
  • 204. D.A. Silva and P.J.M. Monteiro, "ESEM analysis of polymeric film in EVA-modified cement paste", Cement and Concrete Research, 35(10), p. 2047, (2005)
  • 205. J. Kortright, "Resonant soft x-ray techniques to study nanoscale magnetism", Modern Techniques for Characterizing Magnetic Materials, p. 159-200, (2005)
  • 206. M.C.G. Juenger, P. J. M. Monteiro, E. M. Gartner and G. P. Denbeaux, "A soft x-ray microscope investigation into the effects of calcium chloride on tricalcium silicate hydration", Cement and Concrete Research, 35(1), p. 19, (2005)
  • 207. G.- Y Jung, Z. Li, W. Wu, Y, Chen, D. L. Olynick, S.- Y. Wang, W. M. Tong, R. S. Williams, "Vapor-phase self-assembled monolayer for improved mold release in nanoimprint lithography ", Langmuir, 21, p. 1158, (2005)
  • 208. P. Nachimuthu, S. Thevuthasan, V. Shutthanandan, E. M. Adams, W. J. Weber, B. D. Begg, D. K. Shuh, D. W. Lindle, E. M. Gullikson, R. C. C. Perera, "Near-edge x-ray absorption fine-structure stude of ion-beam-induced phase transformation in Gd2(Ti1-yZry)2O7 ", J. Appl. Phys., 97, p. 33518, (2005)
  • 209. P. Nachimuthu, S. Thevuthasan, E. M. Adams, W. J. Weber, B. D. Begg, B. S. Mun, D. K. Shuh, D. W. Lindle, E. M. Gullikson, R. C. C. Perera,, "Near-edge X-ray Absorption Fine Structure Study of Disordering in Gd2(Ti1-yZry)2O7 Pyrochlores ", J. Physical Chem. B Lett , 109, p. 1337, (2005)
  • 210. P. Naulleau, P. Denham, S. Rekawa, "Design and implementation of a vacuum compatible laser-based subnanometer resolution absolute distance measurementsystem ", Opt. Eng., 44, p. 13605, (2005)
  • 211. P. Naulleau, "The effect of mask-roughness on printed contact size variation in EUV lithography ", Appl. Opt. , 44, p. 183, (2005)
  • 212. S. Matsuo, P. Nachimuthu, D. W. Lindle, R. C. C. Perera, H. Wakita, "The Electronic Structures of Crystalline and aqueous solutions of NaBr and NaBrO3 Using In-situ Na K and Br L edge X-ray Absorption Spectroscopy", Physica Scripta , T115, p. 966, (2005)
  • 213. A. Puzic, H. Stoll, B. v. Waeyenberge, J. Raabe, G. Denbeaux, T. Haug, D. Weiss, G. Schutz, "Implementing Sub-ns Time Resolution into Magnetic X-ray Microscopies ", Physica Scripta , T115, p. 1029, (2005)
  • 214. M. Fahnle, J. Alebrecht, T. Eimuller, P. Fischer, E. Goering, D. Steiauf, G. Schutz, "On the imaging of the flux-line lattice of a type-II superconductor by soft x-ray absorption microscopy ", J. Synch. Rad. , (2005)
  • 215. J. P. Cain, G. McIntyre, P. Naulleau, A. Pawloski, B. La Fontaine, O. Wood II, C. J. Spanos, A. R. Neureuther, "Two-wave pattern shift aberration monitor for centrally obscured optical systems ", SPIE, 5751, p. 1230, (2005)
  • 216. R. Soufli, S. L. Baker, S. Ratti, J. C. Robinson, S. Bajt, J. Alameda, E. Spiller, J. S. Taylor, E. M. Gullikson, F. J. Dollar, A. L. Aquila, R. L. Bristol, "Substrate smoothing for high-temperature condenser operation in EUVL source environments ", SPIE, 5751, p. 140, (2005)
  • 217. M.A. Le Gros., G. McDermott, and C.A. Larabell, "X-ray Tomography of Whole Cells", Curr. Opin. Struct. Biol., 15(5), p. 593, (2005)
  • 218. D.A. Silva and P.J.M. Monteiro, "Hydration evolution of C3S - EVA composites analyzed by soft X-ray microscopy", Cement and Concrete Research, 35(2), p. 351, (2005)

• 2004

  • 219. A. Barty, S. Hau-Riege, D. Stearns, M. Clift, P. Mirkarimi, E. Gullikson, H. Chapman, D. Sweeny, "Repairing amplitude defects in multiplayer-coated extreme-ultraviolet lithography reticles by use of a focused ion beam", Appl. Opt. , 43, p. 6545, (2004)
  • 220. A. Persaud, F. I. Allen, F. Gicquel, S. J. Park, J. A. Liddle, T. Schenkel, T. Ivanov, K. Ivanova, I. W. Rangelow, J. Bokor, "Single ion implantation with scanning probe alignment", J. Vac. Sci. Technol. B, 22, p. 2992, (2004)
  • 221. C. Larabell and M. Le Gros, "X-ray Tomography Generates 3-D Reconstructions of the Yeast Saccharomyces cerevisiae at 60-nm Resolution", Molecular Biology of the Cell, 15, p. 956, (2004)
  • 222. P. Naulleau, K. A. Goldberg, J. P. Cain, E. Anderson, P. Denham, K. Jackson, S. Rekawa, F. Salmassi, G. Zhang, "Extreme Ultraviolet Microexposures at the ALS using the 0.3-NA MET Optic ", J. Vac. Sci. Technol. B , 22, p. 2962, (2004)
  • 223. S. -J. Park, J. A. Liddle, A. Persaud, F. I. Allen, T. Schenkel, "Fomation of 15 nm scale Coulomb blockade structures in silicon by electronic beam lithography with a bilayer resist process ", J. Vac. Sci. Technol. B, 22, p. 3115, (2004)
  • 224. K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, E. H. Anderson, J. A. Liddle, "At-Wavelength Alignment and Testing of the 0.3 NA MET Optic ", J. Vac. Sci. & Technol. B , 22, p. 2956, (2004)
  • 225. D. L. Olynick, B. D. Harteneck, E. Vekerov, A. L. D. Kilcoyne, T. Tyliszczak, "25 nm mechanically buttressed high aspect ration zone plates: Fabrication and performance ", J. Vac. Sci. Technol. B, 22, p. 3186, (2004)
  • 226. M. A. Larotonda, B. M. Luther, Y. Wang, Y. Liu, D. Alessi, M. Berrill, A. Dummer, F. Brizuela, C. S. Menoni, M. C. Marconi, V.N. Shlyaptsev, J. Dunn, J.J. Rocca, "Characteristics of a saturated 18.9-nm tabletop laser operating at 5-Hz repetition rate ", IEEE JSTQE, 10, p. 1363, (2004)
  • 227. J. A. Liddle, Y. Cui, P. Alivisatos, "Lithographically directed self-assembly of nanostructures ", J. Vac. Sci. Technol. B, 22, p. 3409, (2004)
  • 228. J.A. Liddle, P. Naulleau, G. Schmid, "Probe shape measurement in an electron beam lithography system", J. Vac. Sci. Technol. B , 22, p. 2897, (2004)
  • 229. G. M. Schmid, L. E. Carpenter II, J. A. Liddle, "Nonaqueous development of silsesquioxane electron beam resist ", J. Vac. Sci. Technol. B, 22, p. 3497, (2004)
  • 230. K. Rosfjord, Y. Liu, D. Attwood, "Tunable Coherent Soft X-rays ", IEEE JSTQE , 10, p. 1405, (2004)
  • 231. J. Nakamura, T. Oguchi, N. Yamada, K. Kuroki, K. Okada, Y. Takano, M. Nagao, I. Sakaguchi, H. Kawarada, R. C. C. Perera, D. L. Ederer, "Holes in the valence band of superconducting boron-doped diamond film studied by soft X-ray absorption and emission spectroscopy ", University of Electro-Communications, (2004)
  • 232. H. Ge, W. Wu, Z. Li, G.-Y. Jung, D. Olynick, Y. Chen, J. A. Liddle, S.-Y. Wang, R. S. Williams, "Cross-linked polymer replica of a nanoimprint mold at 30nm half-pitch ", Nano. Lett. , 5, p. 179, (2004)
  • 233. K. A. Goldberg, P. P. Naulleau, P. E. Denham, S. B. Rekawa, K. H. Jackson, J. A. Liddle, B. Harteneck, E. Gullikson, E. H. Anderson, "Preparations for extreme ultraviolet interferometry of the 0.3 numerical aperture Micro Exposure Tool optic ", J. Vac. Sci. Technol. B , 21, p. 2706, (2004)
  • 234. J. A. Liddle, F. Salmassi, P. P. Naulleau, E. M. Gullikson, "Nanoscale topography control for the fabrication of advanced diffractive optics", J. Vac. Sci. Technol. B , 21, p. 2980, (2004)
  • 235. M.A Le Gros and C.A. Larabell, "Cryo X-ray Tomography: New Tool for 3-D Imaging of Biological Specimens at better than 50 nm Resolution", Microscopy and Microanalysis, 10(suppl2), p. 1016, (2004)
  • 236. P. B. Mirkarimi, E. Spiller, S. L Baker, J. C. Robinson, D. G. Stearns, J. A. Liddle, F. Salmassi, T. Liang , A. R. Stivers, "Advancing the ion beam thin film planarization process for the smoothing of substrate particles", Microelectr. Eng., 77, p. 369, (2004)
  • 237. P. P. Naulleau, J. A. Liddle, F. Salmassi, E. H. Anderson, E. M. Gullikson, "Design, fabrication, and characterization of high-efficiency extreme-ultraviolet diffusers ", Appl. Opt, , 43, p. 5323, (2004)
  • 238. A. L. Aquila, F. Salmassi, E. M. Gullikson, "Measurements of the Optical Constants of Scandium in the 50-1300eV Range ", SPIE, 5538, p. 64, (2004)
  • 239. C. Larabell and M. Le Gros, "Cryo X-ray Tomography of Whole Cells at 50 nm Resolution", Microscopy and Microanalysis, 10(suppl2), p. 1180, (2004)
  • 240. P. Nachimuthu, S. Thevuthasan, M. H. Engelhard, W. J. Weber, D. K. Shuh, N. M. Hamdan, B. S. Mun, M. Adams, D. E. McCready, V. Shutthanandan, D. W. Linde, G. Balakrishnan, D. M. Paul, E. M. Gullikson, R. C. C. Perera, J. Lian, L. M. Wang, R. C. Ewing, "Probing cation antisite disorder in Gd2Ti2O7 pyrochlore by site-specific near-edge x-ray-absorption fine structure and x-ray photoelectron spectroscopy ", Phys. Rev. B , 70, p. 100101, (2004)
  • 241. M. Dubois, V. Lizunov, A. Meister, T. Gulik-Krzywicki, J.M. Verbavatz, E. Perez, J. Zimmerberg, and T. Zemb, "Shape control through molecular segregation in giant surfactant aggregates", Proceedings of the National Academy of Sciences of the United States of America, 101(42), p. 15082, (2004)
  • 242. G. Meier, R. Eiselt, M. Bolte, M. Barthelmes, T. Eimüller, P. Fischer, "Comparative study of magnetization reversal in isolated and strayfield coupled microcontacts", Appl. Phys. Lett., 85, p. 1193, (2004)
  • 243. Y. Muramatsu, M. Yamashita, M. Motoyama, J. D. Denlinger, E. M. Gullikson, R. C. C. Perera, "Evaluation of carbon films on the Japanese smoked roof tile Ibushi-Kawara by angle-dependent soft X-ray emission spectroscopy using synchrotron radiation ", Spectro. Acta Part B , 59, p. 1317, (2004)
  • 244. J. Kortright, "Soft X-ray techniques to study mesoscale magnetism", Synchrotron Radiation News, 17(6), p. 16, (2004)
  • 245. P. Naulleau, "Relevance of mask-roughness-induced printed line-edge roughness in recent and future EUV lithography tests", Appl. Opt. , 43, p. 4025, (2004)
  • 246. J. Nakamura, E. Kabasawa, N. Yamada, Y. Einaga, D. Saito, H. Isshiki, S. Yugo, R. C. C. Perera, "Electronic structures of B-2p and C-2p of boron-doped diamond film by soft X-ray absorption and emission spectroscopy ", Phys. Rev. B , 70, p. 245111, (2004)
  • 247. J.E. Davies, O. Hellwig, E.E. Fullerton, G. Denbeaux, J.B. Kortright, and K. Liu, "Magnetization reversal of Co/Pt multilayers: microscopic origin of high field magnetic irreversibility", Physical Review B: Condensed Matter and Materials Physics, 70(22), p. 4434, (2004)
  • 248. G.A. Johansson, S.M. Khanna, A. Nair, P. Mannström, G. Denbeaux, and M. Ulfendahl, "Exploring the use of soft X-ray microscopy for imaging subcellular structures of the inner ear", Journal of Microscopy, 215(2), p. 203, (2004)
  • 249. G. Y. Jung, S. Ganapathiappan, D. A. A. Ohlberg, D. L. Olynick, Y. Chen, W. M. Tong, R. S. Williams, "Fabrication of a 34 x 34 crossbar structure at 50 nm half-pitch by UV-based nanoimprint lithography ", Nano Lett. , 4, p. 1225, (2004)
  • 250. T. Schenkel, I. W. Rangelow, R. Keller, S. J. Park, J. Nilsson, A. Persaud, V. R. Radmilovic, P. Grabiec, D. H. Schneider, J. A. Liddle, J. Bokor, "Open questions in eletronic sputtering of solids by slow highly charged ions with respect to applications in single ion implantation ", Nucl. Instr. Meth. Phys. Resear. B, 219-220, p. 200, (2004)
  • 251. X. Zhang, A. R. Libertun, A. Paul, E. Gagnon, S. Backus. I.P. Christov, M. M. Murnane, H. C. Kapteyn, R. A. Bartels, Y. Liu, D. T. Attwood, "Highly coherent light at 13 nm generated by use of quasi-phase-matched high-harmonic generation", Opt. Lett. , 29, p. 1357, (2004)
  • 252. K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, J. A. Liddle, E. H. Anderson, "EUV interferometric testing and alignment of the 0.3 NA MET optics ", SPIE, 5374, p. 64, (2004)
  • 253. H. Stoll, A. Puzic B. v. Waeyenberge, P. Fischer, J. Raabe, M. Buess, T. Haug, R. Höllinger, C.H. Back, D. Weiss, G. Denbeaux, "High resolution imaging of fast magnetization dynamics in magnetic nanostructures", Appl. Phys. Lett, 84, p. 3328, (2004)
  • 254. S. -J. Park, A. Persaud, J. A. Liddle, J. Nilsson, J. Bokor, D. H. Schneider, I. W. Rangelow, T. Schenkel, "Processing issues in top-down approaches to quantum computer development in silicon ", Microelectr. Eng. , 73-74, p. 695, (2004)
  • 255. P. Naulleau, K. Goldberg, "Dual-domain lateral shearing interferometer ", U.S. Patent No. , 6,707,650, (2004)
  • 256. C. Spezzani, P. Torelli, R. Delaunay, C. F. Hague, F. Petroff, A. Scholl, E. M. Gullikson, M. Sacchi, , "Resonant diffuse X-ray scattering from magnetic multilayers ", Physica B: Conden. Mat., 345, p. 153, (2004)
  • 257. E. H. Anderson, D. Ha, J. A. Liddle, "Sub-pixel alignment for direct-write electron beam lithography", Microelect. Eng. , 73-74, p. 74, (2004)
  • 258. P. Naulleau, "Verification of point-spread-function-based modeling of an extreme-ultraviolet photoresist", Appl. Opt. , 43, p. 788, (2004)
  • 259. P. P. Naulleau, P. E. Denham, B. Hoef, S. Rekawa, "A design study for synchrotron-based high-numerical-aperture scanning illuminators ", Opt. Commun, 234, p. 53, (2004)
  • 260. P. P. Naulleau, J. A. Liddle, E. H. Anderson, E. M. Gullikson, P. Mirkarimi, F. Salmassi, E. Spiller, "Fabrication of high-efficiency multiplayer-coated gratings for the EUV regime using e-beam patterned substrates ", Opt. Commun. , 229, p. 109, (2004)

• 2003

  • 261. F. Eriksson, G. A. Johansson, H. M. Hertz, E. M. Gullikson, U. Kreissig, J. Brich, "14.5% near-normal incidence reflectance of Cr/Sc x-ray multiplayer mirrors for the water window", Opt. Lett. , 28, p. 2494, (2003)
  • 262. W. Chao, E. H. Anderson, G. Denbeaux, B. Harteneck, A. L. Pearson, D. Olynick, F. Salmassi, C. Song, D. Attwood, "Demonstration of 20nm half-pitch spatial resolution with soft x-ray microscopy", J. Vac. Sci. Technol. B , 21, p. 3108, (2003)
  • 263. P. P. Naulleau, J. A. Liddle, F. Salmassi, E. H. Anderson, E. M. Gullikson, "Design and fabrication of advanced EUV diffractive elements ", SPIE , 5347, p. 9, (2003)
  • 264. M.-Y. Im, P. Fischer, T. Eimüller, G. Denbeaux, S.-C. Shin, "Magnetization reversal study of CoCrPt alloy thin films on a nanogranular length scale using magnetic transmission soft X-ray microscopy", Appl. Phys. Lett., 83, p. 4589, (2003)
  • 265. P. Naulleau, K. A. Goldberg, E. H. Anderson, J. Bokor, B. Harteneck, K. Jackson, D. Olynick, F. Salmassi, S. Baker, P. Mirkarimi, E. Spiller, C. Walton, D. OConnell, P.-Y. Yan, G. Zhang, "Printing-based performance analysis of the engineering test stand set-2 optics using a synchrotron exposure station with variable sigma ", J. Vac. Sci. Technol. B , 21, p. 2697, (2003)
  • 266. W. Chao, E. Anderson, G. P. Denbeaux, B. Harteneck, J. A. Liddle, D. L. Olynick, A. L. Pearson, F. Salmassi, C. Y. Song, D. T. Attwood, "20-nm-resolution soft x-ray microscopy demonstrated by use of multiplayer test structures ", Opt. Lett. , 28, p. 2019, (2003)
  • 267. D. Attwood, E. Anderson, W. Chao, G. Denbeaux, P. Fischer, K. Goldberg, J. A. Liddle, P. Naulleau, G. Schneider, J. Goldsmith, G. Kubiak, J. Taylor and D. Sweeney, "Soft X-ray Microscopy and EUV Lithography: Imaging in the 20-40 nm Regime", The 16th Annual Meeting of the IEEE Lasers & Electro-Optics Society, 1, p. 158, (2003)
  • 268. E. A. Gibson, A. Paul, N. Wagner, R. Tobey, D. Gaudiosi, S. Backus, I. P. Christov, A. Aquila, E. M. Gullikson, D. T. Attwood, M. M. Murnane, H. C. Kapteyn, "Coherent soft x-ray generation in the water window with quasi-phase matching", Science, 302, p. 95, (2003)
  • 269. S. Bajt, H. N. Chapman, N. Nguyen, J. Alameda, J. C. Robinson, M. Malinowski, E. Gullikson, A. Aquila, C. Tarrio, S. Grantham, "Design and performance of capping layers for extreme-ultraviolet multiplayer mirrors", Appl. Opt. , 42, p. 5750, (2003)
  • 270. P. Mercere, P. Zeitoun, M. Idir, S. Le Pape, D. Douillet, X. Hevecq, G. Dovillaire, S. Bucourt, K. A. Goldberg, P. P. Naulleau, S. Rekawa, "Hartmann wave-front measurement at 13.4 nm with lEUV / 120 accuracy", Opt. Lett. , 28, p. 1534, (2003)
  • 271. P. Naulleau, K. A. Goldberg, E. H. Anderson, J. Bokor, E. Gullikson, B. Harteneck, K. Jackson, D. Olynick, F. Salmassi, S. Baker, P. Mirkarimi, E. Spiller, C. Walton, G. Zhang, "Lithographic characterization of the printability of programmed extreme ultraviolet substrate defects ", J. Vac. Sci. Technol. B, 21, p. 1286, (2003)
  • 272. E. Spiller, S. L. Baker, P. B. Mirkarimi, V. Sperry, E. M. Gullikson, D. G. Stearns, "High-performance Mo-Si multiplayer coatings for extreme-ultraviolet lithography by ion-beam deposition ", Appl. Opt. , 42, p. 4049, (2003)
  • 273. E. Spiller, S.L. Baker, P.B. Mirkarimi, V. Sperry, E.M. Gullikson and D.G. Stearns, "High performance Mo-Si multilayer coatings for extreme-ultraviolet lithography by ion-beam deposition ", Appl. Opt. , 42, p. 4049, (2003)
  • 274. P. Naulleau, K. Goldberg, E. Anderson, J. Bokor, E. Gullikson, B. Harteneck, K. Jackson, D. Olynick, F. Salmassi, S. Baker, P. Mirkarimi, E. Spiller, C. Walton, and G. Zhang, "Lithographic characterization of the printability of programmed EUV substrate defects ", J. Vac. Sci. & Technol. B, 21, p. 1286, (2003)
  • 275. S. Tsunashima, N. Takagi, A. Yamaguchi, M. Kume, P. Fischer, M. Kumazawa, "Observation of thermomagnetically recorded domains with high resolution magnetic soft X-ray microscopy", Proc. SPIE, 5060, p. 81, (2003)
  • 276. K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, E. H. Anderson, J. A. Liddle, J. Bokor, "EUV interferometry of the 0.3 NA METOptic ", SPIE, 5073, p. 69, (2003)
  • 277. G. Denbeaux, P. Fischer, G. Schneider, J.A. Liddle, E. Anderson, A. Pearson, C. Weilun, C. Larabell, M. Legros, D. Attwood, "Full-field soft x-ray microscopy at the Advanced Light Source", Synch. Rad. News, 16, (2003)
  • 278. C. Chang, P. Naulleau, D. Attwood, "Analysis of illumination coherence properties in small-source systems such as synchrotrons ", Appl. Opt. , 42, p. 2506, (2003)
  • 279. P. Fischer, "Magnetic soft X-ray transmission microscopy", Current Opinion in Solid State and Materials Science, 7, p. 173, (2003)
  • 280. H. Takenaka, S. Ichimaru, T. Haga, T. Ohchi, H. Ito, Y. Muramatsu, E.M. Gullikson and R.C.C. Perera, " Fabrication of soft X-ray beam splitters for use in the wavelength region around 13 nm ", J. Phys. IV France , 104, p. 251, (2003)
  • 281. P. Fischer, T. Eimuller, G. Schutz, G. Denbeaux, "Imaging magnetic domain structures with soft X-ray microscopy", Struct. Chem. , 14, p. 39, (2003)
  • 282. P. Naulleau, K.A. Goldberg, P. Batson, J. Bokor, P. Denham and S. Rekawa, "A Fourier-synthesis custom-coherence illuminator for EUV microfield lithography ", Appl. Opt. , 42, p. 820, (2003)
  • 283. B. Farangis, P. Nachimuthu, T.J. Richardson, J.L. Slack, M.D. Rubin, D.W. Lindle, E.M. Gullikson, R.C.C Perera, "In situ x-ray absorption spectroscopy study of hydrogen absorption by nickel magnesium thin films ", Phys. Rev. B , 67, p. 85106, (2003)
  • 284. T. Eimüller, P. Fischer, P. Guttmann, G. Denbeaux, M. Scholz, M. Köhler, G. Schmahl, G. Bayreuther, G. Schütz, "Multilayered magnetic nanostrips studied by transmission X-Ray Microscopy", J. Phys IV France, 104, p. 483, (2003)
  • 285. P. Fischer, G. Denbeaux, H. Stoll, A. Puzic, J. Raabe, F. Nolting, T. Eimüller, G. Schütz, "Magnetic imaging with soft X-ray microscopies", J. Phys IV France, 104, p. 471, (2003)
  • 286. G. Denbeaux, G. Schneider, A. Pearson, W. Chao, B. Bates, B. Harteneck, D. Olynick, E. Anderson, P. Fischer, M. Juenger, "Recent progress with high resoluton X-ray microscopy at the XM-1(abstract)", J. Phys IV France, 104, p. 9, (2003)
  • 287. W. Chao, E. Anderson, G. Denbeaux, B. Harteneck, J. A. Liddle, A. Pearson, D. Olynick, F. Salmassi, C. Y. Song, D. T. Attwood, "Photon-based microscopy with 20-nm spatial resolution ", Optics & Photonics News , 18, p. 14(12), (2003)
  • 288. Y. Muramatsu, T. Kaneyoshi, E. M. Gullikson, R. C. C. Perera, "Angle-resolved soft X-ray emission and absorption spectroscopy of hexagonal boron nitride", Spectronc. Acta Part A , 59, p. 1951, (2003)
  • 289. G. Schneider, G. Denbeaux, E. Anderson, B. Bates, F. Salmassi, P. Nachimuthu, A. Pearson, D. Hambach, N. Hoffmann, W. Hasse, K. Hoffmann, "Electromigration in Integrated Circuit Interconnects studied by X-ray Microscopy ", Nuc. Instr. Meth. B , 199, p. 469, (2003)
  • 290. Y. Muramatsu, M. Fujino, T. Yamamoto, E.M. Gullikson and R.C.C. Perera, "Soft X-ray emission and absorption spectroscopy in the Si L region of polysilanes ", Nuc. Instr. Meth. B , 199, p. 60, (2003)
  • 291. J. Wu, W. Walukiewicz, K.M. Yu, J.W. III Ager, E.E. Haller, I. Miotkowski, A.K. Ramdas, C.H. Su, I.K. Sou, R.C.C. Perera, J.D. Denlinger, "Origin of the large band-gap bowling in highly mismatched semiconductor alloys", Phys. Rev. B, 67, p. 35207, (2003)
  • 292. G. Denbeaux, E. Anderson, B. Bates, W. Chao, J.A. Liddle, B. Harteneck, A. Pearson, F. Salmassi, G. Schneider, P. Fischer, T. Eimuller, S. Taylor, H. Chang and G. J. Kusinski, "X-ray magnetic microscopy for correlations between magnetic domains and crystal structure ", J. Phys. IV France , 104, p. 477, (2003)
  • 293. O. Hellwig, G.P. Denbeaux, J.B. Kortright and E.E. Fullerton, "X-ray studies of aligned magnetic stripe domains in perpendicular multilayers", Physica B , 336, p. 136, (2003)
  • 294. P. Naulleau, "The role of temporal coherence in imaging with extreme ultraviolet lithography optics ", Opt. Comm., , 219, p. 57, (2003)
  • 295. A. Barty and K.A. Goldberg, "The effects of radiation induced carbon contamination on the performance of an EUV lithographic optics ", SPIE, 5037, p. 450, (2003)
  • 296. P. Naulleau and G. Gallatin, "The line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization ", Appl. Opt., 42, p. 3390, (2003)
  • 297. J. Bokor and P. Naulleau, "System for interferometric distortion measurements that define an optical path ", U.S. Patent No. , 6,559,952, (2003)
  • 298. E.H. Anderson, D. Ha, J.A. Liddle, "Sub-Pixel Alignment for Direct Write Electron Beam Lithography", "Micro & Nano Engineering, Cambridge, U.K., (2003)
  • 299. W. Ballard, D. Tichenor, D. O'Connell, L. Bernardez , R. Lafon, R. Anderson, A leung, K. Williams, S. Haney, Y. Perras, K. Jefferson, T. Porter, D. Knight, P. Barr, J. Van de Vreugde, R. Campiotti, M. Zimmerman, T. Johnson, L. Klebanoff, P. Grunow, S. Gra, "System and process learning in a full-field, high-power EUVL alpha tool ", SPIE, 5037, p. 47, (2003)
  • 300. P. Naulleau, K. Goldberg, E. Anderson, J. Bokor, B. Harteneck, K. Jackson, D. Olynick, F. Salmassi, S. Baker, P. Mirkarimi, E. Spiller, C. Walton, D. O'Connell, P. Yan, G. Zhang, "Static EUV microexposures using the ETS set-2 optics ", SPIE , 5037, p. 36, (2003)
  • 301. M. Shumway, P. Naulleau, K. Goldberg, J. Bokor, "Resist evaluation at 50 nm in the EUV using interferometric spatial frequency doubled imaging ", SPIE, 5037, p. 910, (2003)
  • 302. J.A. Liddle, A. Persaud, S.J. Park, J. Nilsson, J. Bokor, D.H. Schneider, and T. Schenkel, "", "Micro & Nano Engineering, Cambridge, U.K, (2003)
  • 303. Y. Chen, D. Ohlberg, X, Li, D.R. Stewart, S. Williams, J. Jeppesen, K.A. Nielsen, J.F. Stoddart, D.L. Olynick, E. Anderson, "Nanoscale molecular-switch devices fabricated by imprint lithography", Appl. Phys. Lett, 82, p. 1610, (2003)
  • 304. S. Lee, Patrick Naulleau, Chris Krautschick, Manish Chandhok, Donna OConnell, Eric M. Gullikson, Henry N. Chapman, Michael Goldstein, "Lithographic flare measurements of EUV full-field projection optics ", SPIE, 5037, p. 103, (2003)
  • 305. D. O'Connell, S. Lee, D. Tichenor, W. Ballard, L. Bernardez , J. Goldsmith, S. Haney, K. Jefferson, T. Johnson, A. Leung, W. Replogle, J. Bjorkholm, E. Panning, P. Naulleau, H. Chapman, S. Wurm, G. Kubiak, C. Gwyn, "Lithographic characterization of improved projection optics in the EUVL Engineering Test Stand ", SPIE, 5037, p. 83, (2003)
  • 306. A.L.D. Kilcoyne, T. Tyliszczak, W.F. Steele, S. Fakra, P. Hitchcock, K. Franck, E. Anderson, B. Harteneck, E.G. Rightor, G. E. Mitchell, A.P. Hitchcock, L. Yang, T. Warwick and H. Ade, "Interferometer-controlled scanning transmission X-ray microscopes at the Advanced Light Source ", J. Synchrotron Rad. , 10, p. 125, (2003)
  • 307. K.A. Goldberg and P.P. Naulleau, "Hybrid shearing and phase-shifting point diffraction interferometer", U.S. Patent No., 6,573,997, (2003)
  • 308. H. Takenaka, K. Nagai, H. Ito, S. Ichimaru, T. Ohchi, Y. Muramatsu, E.M. Gullikson, "High reflective CoxCr1-x/C multilayer mirror for using X-ray photoemission spectroscopy in the wavelength region around 6 nm ", J. Phys. IV France, 104, p. 255, (2003)
  • 309. K. Goldberg, P. Naulleau, P. Denham, S.B. Rekawa, K. Jackson, E.H. Anderson, J.A. Liddle, J. Bokor, "EUV interferometry of the 0.3 NA MET Optic ", SPIE , 5037, p. 6, (2003)
  • 310. J. Jimenez-Mier, U. Diebold, D.L. Ederer, T.A. Callcott, M. Grush and R.C. Perera, "Decay channels for the Ti (2p1/2) core hole excitations in TiO2 observed by x-ray Raman scattering", Phys. Rev. B , 65, p. 184105, (2003)
  • 311. S. Robertson, P. Naulleau, K. Goldberg, D. O'Connell, K. McDonald, S. Hansen, T. Delano, K. Brown, R. Brainard, "Calibration of EUV-2D photoresist simulation parameters for accurate predictive modeling", SPIE, 5037, p. 900, (2003)
  • 312. K.E. Kurtis and P.J.M. Monteiro, "Chemical additives to control expansion of alkali-silica reaction gel: proposed mechanisms of control", Journal of Material Science, 38(9), p. 2027, (2003)
  • 313. M.C.G. Juenger, V. Lamour, P.J.M. Monteiro, E.M. Gartner, G.P. Denbeaux, "Direct observation of Cement hydration by X-ray microscopy", Journal of Material Science Letters, 22(19), p. 1335, (2003)
  • 314. J. Miao, K.O. Hodgson, T. Ishikawa, C.A. Larabell, M.A. Le Gros, and Y. Nishino, "Imaging whole Escherichia coli bacteria by using single-particle x-ray diffraction", Proceedings of the National Academy of Sciences of the United States of America, 100(1), p. 110, (2003)
  • 315. G.J. Kusinski, K.M. Krishnan, G. Denbeaux, and G. Thomas, "Magnetic reversal of ion beam patterned Co/Pt multilayers", Scripta Materialia, 48(7), p. 949, (2003)
  • 316. J. Thieme, G. Schneider, and C. Knoechel, "X-ray tomography of a microhabitat of bacteria and other soil colloids with sub-100 nm resolution", Micron, 34(6-7), p. 339, (2003)
  • 317. O. Hellwig, G.P. Denbeaux, J.B. Kortright, and E.E. Fullerton, "X-ray studies of aligned magnetic stripe domains in perpendicular multilayers", Physica B: Condensed Matter, 336(1-2), p. 136, (2003)
  • 318. S. Eisebitt, M. Lorgen, W. Eberhardt, J. Luning, J. Stohr, C.T. Rettner, O. Hellwig, E.E. Fullerton, and G. Denbeaux, "Polarization effects in coherent scattering from magnetic specimen: Implications for X-ray holography, lensless imaging, and ...", Physical Review B: Condensed Matter and Materials Physics, 68(10), p. 104419, (2003)

• 2002

  • 319. C. Chang, P. Naulleau, E. Anderson, K. Rosfjord, D. Attwood, "Diffractive optical elements based on Fourier optical techniques: A new class of optics for extreme ultraviolet and soft x-ray wavelengths", Appl. Opt. , 41, p. 7384, (2002)
  • 320. S. Lee, D. Tichenor, P. Naulleau, D. O'Connell, "Lithographic Aerial Image Contrast Measurement in the EUV Engineering Test Stand ", J. Vac. Sci. Technol. B, 20, p. 2849, (2002)
  • 321. C. Joo, G.S. Pati, C.G. Chen, P.T. Konkola, R.K. Heilmann, M.L. Schattenburg, A. Liddle, E.H. Anderson, "Precision fringe metrology using a Fresnel zone plate", J.Vac. Sci. Technol. B , 20, p. 3075, (2002)
  • 322. M. Park, M. Yi, P. Mirkarimi, C. Larson, J. Bokor, "Characterization of extreme ultraviolet lithography mask defects by actinic inspection with broadband extreme ultraviolet illumination", J.Vac. Sci. Technol. B , 20, p. 3000, (2002)
  • 323. M.N. Piancastelli, W. C. Stolte, G. Ohrwall, S.W. Yu, D. Bull, K. Lantz, A. S. Schlachter, D. W. Lindle, "Fragmentation processes following core excitation in acetylene and ethylene bypartial ion yield spectroscopy ", J. Chem. Phys., 117, p. 8264, (2002)
  • 324. T. Schenkel, A. Persaud, S.J. Park, J. Meijer, J.R. Kingsley; J.W. McDonald, J.P. Holder, J. Bokor, D.H. Schneider, "Single ion implantation for solid state quantum computer development", J.Vac. Sci. Technol. B , 20, p. 2819, (2002)
  • 325. K. Goldberg, P. Naulleau, J. Bokor, H. Chapman, "Testing EUV Optics with Visible-Light and EUV Interferometry ", J. Vac. Sci. Technol. B , 20, p. 2834, (2002)
  • 326. P. Naulleau, K. A. Goldberg, E. H. Anderson, P. Batson, J. Bokor, P. Denham, B. Harteneck,B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, S. Baker, H. Chapman, P. Mirkarimi, E. Spiller, C. Walton, D.OConnell, P.-Y. Yan, G. Zhang, "Lithographic characterization of the ETS Set-2 optic at the Advanced Light Source static microfield exposure station", Sematech EUVL Symp. (Addison, TX), (2002)
  • 327. T.J. Richardson, B. Farangis, J.L. Slack, P. Nachimuthu, R. Perera, N. Tamura, M. Rubin, "X-ray absorption spectroscopy of transition metal-magnesium hydride thin films", J. Alloys & Comp. 1 , "365-357", p. 204, (2002)
  • 328. K.A. Goldberg, P. Naulleau, J. Bokor, P. Denham, S. Rekawa, P. Batson, A. Liddle, B. Harteneck, K. Jackson, E. Anderson, D. Attwood, H. Chapman, A. Barty, G. Sommargren, D. Phillion, J. Taylor, D. Sweeney, "VNL Research in Interferometry for EUV Optics", Sematech EUVL Symp. (Addison, TX), (2002)
  • 329. P. Fischer, G. Denbeaux, T. Ono, T. Okuno, T. Eimuller, D. Goll, G. Schutz, "Study of magnetic domains by magnetic soft x-ray transmission microscopy ", J. Phys. D: Appl. Phys., 35, p. 2391, (2002)
  • 330. G. Schneider, M.A. Meyer, G. Denbeaux, E.H. Anderson, B. Bates, A. Pearson, D. Hambach, E.A. Stach, E. Zschech, "Dynamical x-ray microscopy investigation of electromigration in passivated inlaid Cu interconnect structures", Appl. Phys. Lett. , 81, p. 2535, (2002)
  • 331. M. Koike, K. Sano, O. Yoda, Y. Harada, M. Ishino, N. Moriya, H. Sasai, H. Takenaka, E. Gullikson, S. Mrowka, M. Jinno, Y. Ueno, J.H. Underwood, T. Namioka, "New evaluation beamline for soft X-ray optical elements", Rev. Sci. Instr. , 73, p. 1541, (2002)
  • 332. C. Spezzani, P. Torelli, M. Sacchi, R. Delaunay, C.F. Hague, F. Salmassi, E.M. Gullikson, "Hysteresis curves of ferromagnetic and antiferromagnetic order in metallic multilayers by resonant x-ray scattering ", Phys. Rev. B , 66, p. "052408-1 ", (2002)
  • 333. K. Goldberg, P. Naulleau, J. Bokor, "Fourier-transform interferometer alignment methods", Appl. Opt. , 41, p. 4477, (2002)
  • 334. R.A. Bartels, A. Paul, H. Green, H.C. Kapteyn, M.M. Murnane, S. Backus, I.P. Christov, Y. Liu, D. Attwood, C. Jacobson, "Generation of Spatially Coherent Light at Extreme Ultraviolet Wavelengths", Science, 297, p. 376, (2002)
  • 335. P. Fischer, T. Eimüller, D. Goll, H. Stoll, A. Puzic, G. Schütz, G. Denbeaux, "Magnetic imaging with full-field soft X-ray microscopy", Z. f. Metallkunde, 93, p. 372, (2002)
  • 336. Y. Muramatsu, H. Takenaka, E.M. Gullikson, R.C.C. Perera, "Evaluation Methods of Interlayer-Structure-Distribution in Multilayers by Total-Electron-Yield X-ray Standing Wave Measurement", Adv. X-ray Chem. Analy. , 33, p. 145, (2002)
  • 337. C. Chang, E. Anderson, P. Naulleau, E. Gullikson, K. Goldberg, D. Attwood, "Direct index of refraction measurement at extreme ultraviolet wavelength region with a novel interferometer ", Opt. Lett. , 27, p. 1028, (2002)
  • 338. S.H. Yang, B.S. Mun, N. Mannella, S.-K. Kim, J.B. Kortright, J. Underwood, F. Salmassi, E. Arenholz, A. Young, Z. Hussain, M.A. Van Hove, C.D. Fadley, "Probing buried interfaces with soft x-ray standing wave spectroscopy: application to the Fe/Cr interface", J. Phys.; Condens. Matt. , 14, p. "L407", (2002)
  • 339. T. Eimüller, M. Scholz, P. Guttmann, P. Fischer, M. Köhler, G. Bayreuther, G. Schmahl, G. Schütz, "Undulation instabilities in laterally structured magnetic multilayers", J. Appl. Phys., 91, p. 7334, (2002)
  • 340. R.A. Bartels, A. Paul, M.M. Murnane, H.C. Kapteyn, S. Backus, Y. Liu, D.T. Attwood, "Absolute determination of the wavelength and spectrum of an extreme-ultraviolet beam by a Young's double-slit measurement ", Opt. Lett. , 27, p. 707, (2002)
  • 341. G.J. Kusinski, G. Thomas, G. Denbeaux, K.M. Krishnan, B.D. Terris, "Temperature and ion irradiation dependence of magnetic domains and microstructure in Co/Pt multilayers ", J. Appl. Phys., 91, p. 7541, (2002)
  • 342. K. Goldberg, P. Naulleau, J. Bokor, H. N. Chapman, "Honing the accuracy of extreme ultraviolet optical system testing: at-wavelength and visible-light measurements of the ETS Set-2 projection optic", SPIE, 4688, p. 329, (2002)
  • 343. D. Attwood, "Soft X-ray Microscopy and Extreme Ultraviolet Lithography: Imaging in the 20-50 nm Regime ", Rev. Sci. Instr. , 73, p. 1637, (2002)
  • 344. G. Schneider, M.A. Meyer, G. Denbeaux, E. Anderson, B. Bates, A. Pearson, C. Knchel, D. Hambach, E. A. Stach, E. Zschech, "Electromigration in passivated Cu Interconnects studied by Transmission X-ray Microscopy ", J. Vac. Sci. Technol. B, 20, p. 3089, (2002)
  • 345. E.M. Gullikson, C. Cerjan, D.G. Stearns, P.B. Mirkarimi, D.W. Sweeney, "Practical approach for modeling extreme ultraviolet lithography mask defects ", J. Vac. Sci. Technol. B , 20, p. 81, (2002)
  • 346. M.J. Cich, R. Zhao, E.H. Anderson, E.R. Weber, "Influence of gas transport on the oxidation rate of aluminum arsenide", J. Appl. Phys. , 91, p. 121, (2002)
  • 347. P. Fischer, G. Denbeaux, T. Eimuller, D. Goll, G. Schutz, "Magnetic imaging with soft X-ray microscopy", IEEE Trans. Magn. , 38, p. 2427, (2002)
  • 348. P. Naulleau, P. Batson, P. Denham, D. Richardson, J. Underwood, "An in situ scanning-slit alignment system for Kirkpatrick-Baez optics ", Opt. Comm. , 212, p. 225, (2002)
  • 349. K.A. Goldberg, "Graphical user interface for image acquisition and processing ", U.S. Patent No. , 6341183, (2002)
  • 350. W. Chao, E.H. Anderson, B. Harteneck, D. Olynick, F. Salmassi, D. Attwood, "High resolution and high-efficiency phase zone plate for EUV applications", SPIE, 4688, (2002)
  • 351. P. Fischer, G. Denbeaux, F. Nolting, D. Goll, T. Eimuller, C. Quitmann, G. Schutz, "Imaging magnetic microstructures with soft X-ray microscopies ", Trans. Magn. Soc. Japan, 2, p. 234, (2002)
  • 352. S. Lee, D. Tichenor, W. Ballard, L. Bernardez, J. Goldsmith, S. Haney, K. Jefferson, T. Johnson, A Leung, D. O'Connell, W. Replogle, J. Wronosky, K. Blaedel, P. Naulleau, K. Goldberg, E. Gullikson, H. Chapman, S. Wurm, E. Panning, P. Yan, G. Zhang, J. Bjo, "Lithographic evaluation of the EUV engineering test stand ", SPIE, 4688, p. 266, (2002)
  • 353. C. Spezzani, P. Torelli, M. Sacchi, R. Delaunay, C.F. Hague, A.M. Mirone, F. Salmassi, E.M. Gullikson, J.H. Underwood, "Magnetic coupling in Co/Cu multilayers: field-dependent antiferromagnetic ordering investigated by resonant x-ray scattering ", Surf. Rev. Lett. , 9, p. 921, (2002)
  • 354. P.B. Mirkarimi, D.G. Stearns, S.L. Baker, J.W. Elmer, D.W. Sweeney, E.M. Gullikson, "Method for repairing Mo/Si multilayer thin film phase defects in reticles for extreme ultraviolet lithography ", J. Appl. Phys. , 91, p. 81, (2002)
  • 355. M. Khler, J. Zweck, G. Bayreuther, P. Fischer, G. Schtz, G. Denbeaux, D. Attwood, "Micromagnetic investigation of sub-100 nm magnetic domains in atomically stacked Fe(001)/Au(001) multilayers ", J. Magn. Magn. Mat. , 240, p. 79, (2002)
  • 356. D. Tichenor, W. Replogle, S. Lee, W. Ballard, G. Kubiak, L. Klebanoff, J. Goldsmith, J. Wronosky, L. Hale, H. Chapman, J. Taylor, K. Goldberg, P. Naulleau, "Performance upgrades in the EUV Engineering Test Stand ", SPIE, 4688, p. 72, (2002)
  • 357. D. Attwood, G. Kubiak, D. Sweeney, S. Hector, C. Gwyn, "Progress and Future Directions of the US EUV Lithography Program", Intern. Micro and Nanotechn. Matsue, Japan, (2002)
  • 358. J.A. Liddle, G.M. Gallatin, L.E. Ocola, "Resist Requirements and Limitations for Nanoscale Electron-Beam Patterning", Materials Research Society Fall Meeting, Boston, MA, (2002)
  • 359. Y. Muramatsu, K. Kuramoto, E. M. Gullikson, R.C.C. Perera, "Soft x-ray absorption spectra in the 0 K region of microporous carbon and some reference aromatic compounds", Surf. Rev. Lett. , 9, p. 267, (2002)
  • 360. D. Attwood, E. Anderson, G. Denbeaux, K. Goldberg, P. Naulleau, G. Schneider, "Soft X-ray microscopy and EUV lithography: an update on imaging at 20-40 nm spatial resolution", X-Ray Lasers 2002, (2002)
  • 361. Y. Liu, D. Attwood, J. J. Rocca, M.M. Murnane, H.C. Kapteyn, "Spatial Coherence of Currently Available EUV/Soft X-ray Sources", X-ray Lasers 2002, (2002)
  • 362. P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Hoef, K. Jackson, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, R. Soufli, E. Spiller, D.Sweeney, J. Taylor, C. Walton, G. Cardinale, A. Ray-Cha, "Static microfield printing at the Advanced Light Source with the ETS Set-2 optic ", SPIE , 4688, p. 64, (2002)
  • 363. P. Naulleau, K. Goldberg, E. Anderson, D. Attwood, P. Batson, J. Bokor, P. Denham, E. Gullikson, B. Harteneck, B. Hoef, K. Jackson, D. Olynick, S. Rekawa, F. Salmassi, K. Blaedel, H. Chapman, L. Hale, P. Mirkarimi, R. Soufli, E. Spiller, D. Sweeney, J. Ta, "Sub-70-nm EUV Lithography at the Advanced Light Source Static Microfield Exposure Station Using the ETS Set-2 Optic", J. Vac. Sci. Technol. B , 20, p. 2829, (2002)
  • 364. P. Naulleau, W. Sweatt, D. Tichenor, "Theoretical efficiency analysis of a condenser-embedded grating-based spectral purity filter for EUV lithography ", Opt. Comm. , 214, p. 31, (2002)
  • 365. Y. Muramatsu, H. Takenaka, E.M. Gullikson, R.C.C. Perera, "Total-electron-yield x-ray standing-wave measurements of multilayer x-ray mirrors for the interface structure evaluation ", Jpn. J. Appl. Phys. , 41, p. 4250, (2002)
  • 366. K.E. Kurtis,C.L. Collins and P.J.M. Monteiro, "The surface chemistry of the alkali-silica reaction: A critical evaluation and X-ray microscopy", Concrete Science and Engineering, 4, p. 1, (2002)
  • 367. S. Myneni, "Soft X-ray Spectroscopy and Spectromicroscopy Studies of Organic Molecules in the Environment", Applications of Synchrotron Radiation in Low-Temperature Geochemistry and Environmental Science, 49, p. 485-579, (2002)
  • 368. G. Schneider, E. Anderson, S. Vogt , C. Knochel, D. Weiss, M. Legros, and C.A. Larabell, "Computed tomography of cryogenic cells", Surface Review and Letters, 9(1), p. 177, (2002)
  • 369. C. A. Larabell and M. A. Le Gros, "X-Ray Cryo-Tomography of Whole Yeast at 60 nm Resolution", Microscopy and Microanalysis, 10(suppl2), p. 1016, (2002)

• 2001

  • 370. G. Denbeaux, "X-ray microscopy: imaging with short wavelengths for high spatial resolution", Proceedings of OSA Annual Meeting, OSA Annual Meeting , (2001)
  • 371. T. Eimüller, P. Fischer, M. Köhler, M. Scholz, P. Guttmann, G. Denbeaux, S. Glück, G. Bayreuther, G. Schmahl, D. Attwood, G. Schütz, "Imaging magnetic domains with Magnetic Transmission X-ray Microscopy", Appl. Phys., 73, p. 697, (2001)
  • 372. G. Denbeaux, E. Anderson, W. Chao, T. Eimüller, L. Johnson, M. Köhler, C. Larabell, M. Legros, P. Fischer, A. Pearson, G. Schütz, D. Yager and D. Attwood, "Soft X-Ray Microscopy to 25 nm with Applications to Biology and Magnetic Materials", Nucl. Instr. And Methods in Phys. Res, 467, p. 841, (2001)
  • 373. G. Denbeaux, "A full field x-ray microscope for high-resolution imaging: advances and applications", Proceedings of 5th Harima International Forum, (2001)
  • 374. G. Denbeaux, P. Fischer, G. Kusinski, M. LeGros, A. Pearson, D. Attwood, "A full field transmission X-ray microscope as a tool for high resolution magnetic imaging", IEEE Trans on Magn., 37, p. 2764, (2001)
  • 375. P. Fischer, T. Eimüller, S. Glück, G. Schütz, S. Tsunashima, M. Kumazawa, N. Takagi, G. Denbeaux and D. Attwood, "High Resolution Imaging of Magnetic Domains with Magnetic Soft X-ray Microscopy", J. Magn. Soc. of Japan, 25, p. 186, (2001)
  • 376. N. Takagi, P. Fischer and S. Tsunashima, "Observation of Thermomagnetically Recorded Domains with high resolution magnetic X-ray Microscopy (in Japanese)", J. Magn. Soc. of Japan, 25, p. 1370, (2001)
  • 377. P. Fischer, T. Eimüller, G. Schütz, M. Köhler, G. Bayreuther, G. Denbeaux, D. Attwood, "Study of in-plane magnetic domains with Magnetic Transmission X-ray microscopy", J. Appl. Phys., 89, p. 7159, (2001)
  • 378. T. Eimüller, M. Scholz, P. Guttmann, P. Fischer, M. Köhler, G. Bayreuther, G. Schmahl, G. Schütz, "Magnetization reversal of a multilayered FeGd dot array imaged by Transmission X-ray Microscopy", J. Appl. Phys., 89, p. 7162, (2001)
  • 379. P. Fischer, T. Eimüller, G. Schütz, G. Denbeaux, A. Lucero, L. Johnson, D. Attwood, S. Tsunashima, M. Kumazawa, N. Takagi, M. Köhler, and G. Bayreuther, "Element-specific imaging of magnetic domains at 25nm spatial resolution using soft X-ray microscopy", Rev. Sci. Instr., 72, p. 2322, (2001)
  • 380. P. Fischer, T. Eimüller, G. Schütz, G. Bayreuther, S. Tsunashima, N. Takagi, G. Denbeaux and D. Attwood, "Magnetic Domains in nanostructured media studied with M-TXM", J. Synchr. Rad., 8, p. 325, (2001)
  • 381. E.M. Gullikson, S. Mrowka, B.B. Kaufmann, "Recent Developments in EUV Reflectometry at the Advanced Light Source.", Proceedings of the SPIE, 363, (2001)
  • 382. N. Takagi, P. Fischer, S. Tsunashima, M. Kumazawa, H. Ishida, A. Yamaguchi, H. Noguchi, and M. Kume, "Observation of Thermomagnetically Recorded Magnetic Domains in TbFeCo Films with X-ray Microscopy", Jap. J. Appl. Phys., 40, p. L380, (2001)
  • 383. W. Meyer-Ilse, D.Hamamoto, A. Nair, S.A. Lelievre, G. Denbeaux, L. Johnson, A.L. Person, D. Yager, M.A. LeGros and C.A. Larabell, "High resolution protein localization using soft X-ray microscopy", Journal of Microscopy, 200, p. 395, (2001)
  • 384. W. Chao E. Anderson, G. Denbeaux, B. Harteneck, A. Pearson, D. Olynick, G. Schneider, and D. Attwood, "Experimental analysis of high-resolution soft x-ray microscopy", Proc. SPIE, 4499, p. 134, (2001)
  • 385. J. Ziegelbauer, B. Shan, D. Yager, C. Larabell, B. Hoffmann, and R. Tjian, "Transcription factor MIZ-1 is regulated via microtubule association", Applied Physics Letters, 79(14), p. 2211, (2001)
  • 386. B.W. Loo, Jr., I.M. Sauerwald, A.P. Hitchcock, and S.S. Rothman, "A new sample preparation method for biological soft X-ray microscopy: nitrogen-based contrast and radiation tolerance...", Journal of Microscopy, 204(1), p. 69, (2001)

• 2000

  • 387. E. Gartner, K.E. Kurtis and P.J.M. Monteiro, "Proposed mechanism of C-S-H growth tested by X-ray microscopy", Cement and Concrete Research, 30(5), p. 817, (2000)
  • 388. B.W. Loo, W. Meyer-Ilse, and S. Rothman, "Automatic image acquisition, calibration and montage assembly for biological x-ray microscopy", Journal of Microscopy, 197(2), p. 185, (2000)
  • 389. K.E. Kurtis, W. Meyer-Ilse and P.J.M. Monteiro, "Soft x-ray spectromicroscopy for in situ study of corrosion", Journal of Corrosion Science, 42(8), p. 1327, (2000)
  • 390. A. Pearson, W. Chao, G. Denbeaux, T. Eimüller, P. Fischer, L. Johnson, M. Köhler, C. Larabell, M. Le Gros, D. Yager, D., Attwood, "XM-1, the High Resolution Soft X-ray Microscope at the Advanced Light Source", Proceedings of SPIE, 4146, p. 54, (2000)
  • 391. C.A. Larabell, D. Yager, and W. Meyer-Ilse, "Localization of proteins and nucleic acids using soft x-ray microscopy", AIP conf. proc., 507, p. 107, (2000)
  • 392. K.E. Kurtis, P.J.M. Monteiro, J.T. Brown, and W. Meyer-Ilse, "Transmission Soft X-ray Microscopy Study of Chemical Additives Used to Control Alkali-Silica Reaction Gel Expansion", AIP conf. proc., 507, p. 213, (2000)
  • 393. G. Denbeaux, L.E. Johnson, and W. Meyer-Ilse, "Spectromicroscopy at the XM-1", AIP conf. proc., 507, p. 478, (2000)
  • 394. T.W. Ford, W. Meyer-Ilse, and A.D. Stead, "Development and Evaluation of Cryo-Imaging of Unicellular Algae Using Soft X-ray Transmission Microscopy: Ultrastructure and ...", AIP conf. proc., 507, p. 119, (2000)
  • 395. M.M. Moronne, D.J. Hamamoto, L.E. Johnson, G.P. Denbeaux, and W. Meyer-Ilse, "Potential Application of Vanadium Probes for Biological X-ray Microscopy", AIP conf. proc., 507, p. 184, (2000)
  • 396. W. Meyer-Ilse, L.E. Johnson, G. Denbeaux, W.A. Bates, A. Lucero, and E.H. Anderson, "The XM-1 High Resolution X-Ray Microscope at the Advanced Light Source", Synchrotron Radiation Instrumentation: Eleventh U.S. National Conference, 521, p. 13, (2000)
  • 397. C.A. Larabell, D. Yager, W. Meyer-Ilse, and B. Rowning, "From dynamics to details: live-dell light microscopy and high resolution (25 nm) soft x-ray microscopy", Microscopy and Microanalysis, 6(suppl2), p. 84, (2000)
  • 398. E.H. Anderson, D. Olynick, B. Harteneck, E. Veklerov, G. Denbeaux, W. Chao, A. Pearson, L.E. Johnson, and D.T. Attwood, "Nanofabrication and diffractive optics for high-resolution x-ray applications", Journal of Vacuum Science and Technology B: Microelect. & Nanometer Structures, 18(6), p. 2970-2975, (2000)
  • 399. A. Pearson, W. Chao, G. Denbeaux, T. Eimüller, P. Fischer, L. Johnson, M. Köhler, C. Larabell, M. Le Gros, D. Yager, D., Attwood, "XM-1, the High Resolution Soft X-ray Microscope at the Advanced Light Source", Proceedings of SPIE, 4146, p. 54, (2000)
  • 400. K.E. Kurtis, P.J.M. Monteiro, and W. Meyer-Ilse, "Examination of the effect of LiCl on ASR gel expansion", Proceedings of the 11th International Conference on Alkali-Aggregate Reaction (ICAAR), (2000)
  • 401. K.E. Kurtis and N.N. Naik, "Pozzolanic reaction examined through laser scanning confocal microscopy and transmission xoft x-ray microscopy", Proceedings of the AIChE Spring National Meeting, AIChE Spring National Meeting-Topical on Fuel Performance, (2000)

• 1999

  • 402. K.E. Kurtis, P.J.M. Monteiro, J.T. Brown, and W. Meyer-Ilse, "High resolution transmission soft X-ray microscopy of deterioration products developed in large concrete dams", Journal of Microscopy, 196(3), p. 288, (1999)
  • 403. E.S. Gilbert, A.V. Khlebnikov, W. Meyer-Ilse, and J.D. Keasling, "Use of soft x-ray microscopy for analysis of early-stage biofilm formation", Water Science and Technology, 39(7), p. 269, (1999)
  • 404. D. Attwood, " Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications", Cambridge University Press, p. 1-470, (1999)
  • 405. W. Meyer-Ilse, "X-ray Microscopy and Microanalysis", Encyclopedia of Applied Physics, p. 673-691, (1999)
  • 406. S.C.B. Myneni, J.T. Brown, G.A. Martinez, and W. Meyer-Ilse, "Imaging of humic substance macromolecular structures in water and soils", Science, 286(5443), p. 1335, (1999)

• 1998

  • 407. K. Kurtis, P. Monteiro, F. Rodrigues, J. Brown, and W. Meyer-Ilse, "Effect of chemical additives on alkali-silica reaction gel expansion in concrete as observed by transmission x-ray microscopy", 1998 Spring Meeting of the Materials Research Society, (1998)
  • 408. E. M. Gullikson, "Scattering from normal incidence EUV optics", Proceedings of the SPIE, p. 3331-08, (1998)
  • 409. K.E. Kurtis, P.J.M. Monteiro, J. Brown, and W. Meyer-Ilse, "Imaging of ASR Gel by Soft X-ray Microscopy", Cement and Concrete Research, 28(3), p. 411, (1998)
  • 410. K.E. Kurtis, P. Monteiro, J.T. Brown, and W. Meyer-Ilse, "Expansion Reaction in Concrete Observed by Soft X-ray Transmission Microscopy", Applications of Synchrotron Radiation Techniques to Materials Science IV, 524, p. 3-9, (1998)
  • 411. W.J. Kozek, J. Brown, C.A. Larabell, and M.M. Moronne, "Applications of soft x-ray and other microscopy techniques to elucidate the structure of parasitic metazoa", Microscopy and Microanalysis, 4(2), p. 1156, (1998)
  • 412. J. Heck, W. Meyer-Ilse, E.H. Anderson, and D.T. Attwood, "Resolution determination in x-ray microscopy: an analysis of the effects of partial coherence and illumination spectrum", Journal of X-ray Science and Technology , 8(2), p. 95, (1998)
  • 413. J. Yeung, J.T. Brown, A. Nair, E. Meites, R.L. Coppel, N. Mohandas, W. Meyer-Ilse, and C. Magowan, "X-ray microscopic visualization of specific labeling of adhesive molecule CD36 and cytoadherence by plasmodium falciparum ...", Research Communications in Molecular Pathology and Pharmacology, 99(3), p. 243, (1998)
  • 414. J.M. Heck, W. Meyer-Ilse and D.T. Attwood, "Resolution Determination in X-ray microscopy", X-ray Microscopy and Spectromicroscopy, p. II-129, (1998)
  • 415. W. Meyer-Ilse, H. Medecki, J. Brown, J. Heck, E.H. Anderson, C. Magowan, A.D. Stead, T.W. Ford, R.L. Balhorn, ..., "X-ray microscopy in Berkeley", X-ray Microscopy and Spectromicroscopy, p. I-1, (1998)
  • 416. R.L. Balhorn, R.E. Braun, B. Breed, J.T. Brown, J.M. Heck, J. Kirz, I. McNulty, W. Meyer-Ilse, and X. Zhang, "Application of X-ray Microscopy to the Analysis of Sperm Chromation", X-ray Microscopy and Spectromicroscopy, p. II-29, (1998)
  • 417. A.D. Stead, P.A.F. Anastasi, J. Brown, T. Majima, W. Meyer-Ilse, D. Neely, A.M. Page, S. Rondot, H. Shimizu, T. Tomie, and ..., "If Carbon Discrimination is More Important to Biologists Than Resolution, Will Soft X-ray Microscopy Become a Useful ... ", X-ray Microscopy and Spectromicroscopy, p. II-149, (1998)
  • 418. A.D. Stead, J. Brown, J. Judge, W. Meyer-Ilse, D. Neely, A.M. Page, E. Wolfrum, and T.W. Ford, "Use of Soft X-rays to Image Hydrated and Dehydrated Bacterial Spores Using Either Contact Microscopy or Soft X-ray ...", X-ray Microscopy and Spectromicroscopy, p. II-157, (1998)
  • 419. T.W. Ford, A.M. Page, W. Meyer-Ilse, and A.D. Stead, "A Comparative Study of the Ultrastructure of Living Cells of the Green Alga Chlamydomonas Using Both Soft X-ray Contact and ...", X-ray Microscopy and Spectromicroscopy, p. II-185, (1998)
  • 420. S. Lindaas, B.H. Calef, K. Downing, M. Howells, C. Magowan, D. Pinkas, and C.J. Jacobsen, "X-ray Holography of Fast-Frozen Hydrated Biological Samples", X-ray Microscopy and Spectromicroscopy, p. II-75, (1998)

• 1997

  • 421. E. M. Gullikson, D. G. Stearns, D. P. Gaines, and J. H. Underwood, "Non-specular scattering from multilayer mirrors at normal incidence", Proceedings of the SPIE, 3113, p. 412-9, (1997)
  • 422. C. Magowan, J.T. Brown, J. Liang, J. Heck, R.L. Coppel, N. Mohandas, and W. Meyer-Ilse, "Intracellular structures of normal and aberrant Plasmodium falciparum malaria parasites imaged by soft x-ray microscopy", Proceedings of the National Academy of Sciences of the United States of America, 94, p. 6222, (1997)
  • 423. W. Meyer-Ilse, H. Medecki, J. Brown, J. Heck, E.H. Anderson, C. Magowan, A.D. Stead, T.W. Ford, and D.T. Attwood, "High Resolution Soft X-ray Microscopy", Proceedings of International Conference on Soft X-rays in the 21st Century, (1997)
  • 424. A. Robinson, "Biological x-ray microscopy of the Advanced Light Source", Society for Industrial Microbiology News, 47(1), p. 5, (1997)
  • 425. S.C.B. Myneni, T.K. Tokunaga, and G.E. Brown, Jr., "Abiotic selenium redox transformations in the present of Fe(II,III) oxides", Science, 278(5340), p. 1106, (1997)

• 1996

  • 426. J. H. Underwood, E. M. Gullikson, M. Koike, P. J. Batson, P. E. Denham, K. D. Franck, R. E. Tackaberry, and W. F. Steele, "Calibration and Standards beamline 6.3.2 at the Advanced Light Source", Rev. Sci. Instrum., 9, (1996)
  • 427. J. Brown, C. Magowan, R.L. Balhorn, J. Heck, and W. Meyer-Ilse, "Biological applications of XM-1", Proceedings of International Conference on X-ray Microscopy and Spectroscopy, (1996)

• 1995

  • 428. W. Meyer-Ilse, H. Medecki, C. Magowan, R.L. Balhorn, M.M. Moronne, and D.T. Attwood, "Advanced microscopy: The new high resolution zone-plate microscope at the Advanced Light Source in Berkeley", JMSA Proceedings Microscopy and Microanalysis, (1995)
  • 429. W. Meyer-Ilse, H. Medecki, L. Jochum, E. Anderson, D.T. Attwood, C. Magowan, R.L. Balhorn, M.M. Moronne, D. Rudolph, and ..., "New high-resolution zone-plate microscope at Beamline 6.1 of the Advanced Light Source", Synchrotron Radiation News, 8, p. 29, (1995)
  • 430. L. Jochum, and W. Meyer-Ilse, "Partially coherent image formation with x-ray microscopes", Applied Optics, 34(22), p. 4944, (1995)

• 1994

  • 431. M. Koike, R. Beguiristain, J. H. Underwood, T. Namioka, "A new optical design method and its application to an extreme ultraviolet varied line spacing plane grating monochromator", Nuclear Instruments & Methods in Physics Research, A347, p. 273-7, (1994)
  • 432. W. Meyer-Ilse, M.M. Moronne, C. Magowan, H. Medecki, J. Hearst, D.T. Attwood, P. Guttmann, G. Schneider, and T. Wilheim, "Techniques and Applications of X-ray Microscopy", X-ray Microscopy IV, (1994)

• 1992

  • 433. E. M. Gullikson, J. H. Underwood, P. J. Batson, and V. Nikitin, "A Soft X-Ray/EUV Reflectometer Based on a Laser Produced Plasma Source", Journal of X-Ray Science and Technology, 3, p. 283-299, (1992)

• 0000

  • 434. D. Attwood, "Pocket diary for x-ray and EUV scientists", , (0000)